SCHEMBL58499

SCHEMBL58499

CCC(Cc1ccccc1)(C(=O)c1ccc(N(C)C)cc1)N(C)C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.51
MEN1 O00255 2/20 0.51
ALDH1A1 P00352 9/20 0.49
HPGD P15428 5/20 0.49
MAPT P10636 5/20 0.49
RAB9A P51151 5/20 0.47
NPC1 O15118 3/20 0.47
SMN1; SMN2 Q16637 3/20 0.42
LMNA P02545 1/20 0.42
KDM4E B2RXH2 2/20 0.41
CASP3 P42574 1/20 0.40
CYP1B1 Q16678 1/20 0.40
SENP8 Q96LD8 1/20 0.40
SENP7 Q9BQF6 1/20 0.40
SENP6 Q9GZR1 1/20 0.40
CNR2 P34972 1/20 0.40
MAPK1 P28482 2/20 0.39
MLYCD O95822 1/20 0.39
ALOX15 P16050 1/20 0.39
NFKB1 P19838 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4812459 0.94 RAB9A (0.47) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL8900778 0.93 KMT2A (0.55) KMT2AMEN1ALDH1A1HPGDMAPT
Benzene SCHEMBL28672020 0.90 RIPK1 (0.43) KMT2AMEN1RAB9ANPC1SMN1; SMN2
SCHEMBL4650526 0.90 RIPK1 (0.43) KMT2AMEN1RAB9ANPC1SMN1; SMN2
SCHEMBL8898604 0.88 SRD5A1 (0.47) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL8898890 0.87 LMNA (0.42) ALDH1A1HPGDMAPTLMNAMLYCD
SCHEMBL4651747 0.87 NPC1 (0.41) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL8899758 0.87 PPARG (0.48) KMT2AMEN1MAPTRAB9ANPC1
SCHEMBL20074485 0.87 CNR2 (0.44) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL8631398 0.86 ACHE (0.43) KMT2AMEN1ALDH1A1HPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080180503-A1 INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2008-07-31 US claimed
CN-114384758-B Black photosensitive resin composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2025-05-13 CN disclosed
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
US-12210285-B2 Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device TORAY INDUSTRIES, INC. (JP) 2025-01-28 US disclosed
CN-114384757-B Black photosensitive resin composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-11-19 CN disclosed
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117651722-A Thiol-containing composition, photocurable composition, and thermosetting composition 株式会社力森诺科 2024-03-05 CN disclosed
CN-117031874-A Negative photosensitive resin composition, cured product, and method for producing patterned cured product 东京应化工业株式会社 2023-11-10 CN disclosed
US-5554663-A α-aminoacetophenones as photoinitiators CIBA-GEIGY CORPORATION (US) 1996-09-10 US disclosed
US-5541038-A FOR THICK FILM PRINTING PLATES, MIXTURE OF PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1996-07-30 US disclosed
US-5534629-A PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
US-5306600-A Oxygen-containing titanocenes, and the use thereof CIBA-GEIGY CORPORATION (US) 1994-04-26 US disclosed
EP-0284561-B1 ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS CIBA-GEIGY AG (CH) 1993-05-12 EP disclosed
US-5192642-A Photoinitiators for addition photopolymerization, coatings CIBA-GEIGY CORPORATION (US) 1993-03-09 US disclosed
EP-0485334-A2 Photopolymerizable compositions TOKYO OHKA KOGYO CO., LTD. (JP) 1992-05-13 EP disclosed
US-5077402-A For photocuring pigmented systems; printing inks, lacquers CIBA-GEIGY CORPORATION (US) 1991-12-31 US disclosed
US-5068371-A Photoinitiators for polymerization CIBA-GEIGY CORPORATION (US) 1991-11-26 US disclosed
EP-0284561-A2 Alpha-aminoacetophenones as photo initiators CIBA-GEIGY AG (CH) 1988-09-28 EP disclosed