SCHEMBL5849960

SCHEMBL5849960

O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.c1ccc(Sc2ccccc2[S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.32
PTGS2 P35354 1/20 0.32
KDM4E B2RXH2 1/20 0.31
NSD2 O96028 1/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2634630 0.99 PTGS1 (0.32) PTGS1PTGS2KDM4ENSD2MAPT
Trifluoromethanesulfonic Acid SCHEMBL5850147 0.87 PTGS1 (0.39) PTGS1PTGS2KDM4ENSD2MAPT
SCHEMBL4643980 0.85 MMP13 (0.34)
SCHEMBL2895613 0.84 CA1 (0.33)
SCHEMBL51399 0.81 CA2 (0.38)
SCHEMBL1482705 0.81 CA2 (0.38)
SCHEMBL30013853 0.81 KCNQ3 (0.31) MAPT
SCHEMBL546546 0.80 CA2 (0.39)
SCHEMBL4535202 0.80 CA2 (0.39)
Perflubutane SCHEMBL6325042 0.80 CA2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6984473-B2 Light blocking; amplified photoresist; acid generators; high density semiconductors MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-01-10 US disclosed
US-20030152845-A1 Mask blank, protective film therefor and method of patterning mask blank MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-08-14 US disclosed