Dimethylamine

Dimethylamine

SCHEMBL5874936

CNC.O=S(=O)(O)c1ccccc1

nearest known ligand 0.80

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12

The experimentally established mechanism targets of Dimethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.80
SMN1; SMN2 Q16637 2/20 0.80
POLB P06746 1/20 0.54
CYP2D6 P10635 1/20 0.54
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
MMP1 P03956 1/20 0.50
MMP2 P08253 1/20 0.50
MMP9 P14780 1/20 0.50
MMP8 P22894 1/20 0.50
MMP13 P45452 1/20 0.50
LMNA P02545 2/20 0.48
HTR6 P50406 2/20 0.48
ALDH1A1 P00352 4/20 0.46
NT5E P21589 1/20 0.46
PSIP1 O75475 1/20 0.46
GAA P10253 1/20 0.46
BCAT1 P54687 1/20 0.45
HSD17B10 Q99714 2/20 0.45
TDP1 Q9NUW8 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2638204 0.92 TSHR (0.84) TSHRSMN1; SMN2POLBCYP2D6CA1
Methylhydrazine SCHEMBL28282625 0.91 TSHR (0.73) TSHRSMN1; SMN2POLBCYP2D6CA1
Sulfuric Acid SCHEMBL6731449 0.90 TSHR (0.80) TSHRSMN1; SMN2POLBCYP2D6CA1
Methyl Alcohol SCHEMBL2996522 0.90 TSHR (0.89) TSHRSMN1; SMN2POLBCYP2D6CA1
Ethane SCHEMBL4196548 0.90 TSHR (0.89) TSHRSMN1; SMN2POLBCYP2D6CA1
SCHEMBL3409457 0.89 TSHR (1.00) TSHRSMN1; SMN2POLBCYP2D6CA1
SCHEMBL30307036 0.89 TSHR (1.00) TSHRSMN1; SMN2POLBCYP2D6CA1
SCHEMBL597672 0.89 TSHR (1.00) TSHRSMN1; SMN2POLBCYP2D6CA1
Benzene SCHEMBL9751882 0.89 TSHR (1.00) TSHRSMN1; SMN2POLBCYP2D6CA1
SCHEMBL2509 0.89 TSHR (1.00) TSHRSMN1; SMN2POLBCYP2D6CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022120372-A1 SALTS OF A HETEROCYCLIC COMPOUND AND CRYSTALLINE FORMS, PROCESSES FOR PREPARING, THERAPEUTIC USES, AND PHARMACEUTICAL COMPOSITIONS THEREOF SUNOVION PHARMACEUTICALS INC. (US) 2022-06-09 WO claimed
CN-113784755-B Salts of isochroman-based compounds, crystalline forms thereof, methods of preparation, therapeutic uses and pharmaceutical compositions 赛诺维信制药公司 2024-05-10 CN disclosed
CN-117255836-A Coated article, method of making coated article, and method of making composition 康宁公司 2023-12-19 CN disclosed
CN-104926729-B A kind of method for synthesizing ethiprole 上海泰禾国际贸易有限公司 2018-01-19 CN disclosed
CN-101752098-B Method of manufacturing solid electrolytic capacitor SANYO ELECTRIC CO 2012-11-14 CN disclosed
CN-101752098-A Method of manufacturing solid electrolytic capacitor SANYO ELECTRIC CO 2010-06-23 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
EP-0736574-B1 Thermoplastic resin composition comprising carbonate and acrylic resin GEN ELECTRIC (US) 2004-06-02 EP disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
US-6103827-A A TRANSPARENT THERMOPLASTIC RESIN BLENDS GENERAL ELECTRIC COMPANY (US) 2000-08-15 US disclosed
US-5888308-A Process for removing residue from screening masks with alkaline solution INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-03-30 US disclosed
US-5883194-A RADIATION TRANSPARENT THERMOPLASTIC RESINS OF CARBONATE AND ESTER BLENDS WITH ACRYLATE RESINS AND CATALYSTS GENERAL ELECTRIC COMPANY (US) 1999-03-16 US disclosed
CN-1141935-A Thermoplastic resin composition GEN ELECTRICS CORP (US) 1997-02-05 CN disclosed
EP-0736574-A2 Thermoplastic resin composition comprising carbonate and acrylic resin GENERAL ELECTRIC COMPANY (US) 1996-10-09 EP disclosed
US-5053494-A FIBER REACTIVE POLYAZO DYE HAVING TWO VINYLSULFONE TYPE REACTIVE GROUPS THROUGH TRIAZINYL BRIDGING GROUP SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-10-01 US disclosed
EP-0266774-B1 POLYAZO COMPOUND HAVING TWO VINYLSULFONE TYPE FIBER REACTIVE GROUPS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-08-28 EP disclosed
EP-0266774-A1 Polyazo compound having two vinylsulfone type fiber reactive groups SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-05-11 EP disclosed