Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3207202 | 0.88 | CD81 (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL7521808 | 0.80 | — | — | |
| SCHEMBL1089320 | 0.80 | THRB (0.33) | CD81THRBCYP2C9 | |
| SCHEMBL596454 | 0.80 | CD81 (0.34) | CD81THRBCYP2C9 | |
| SCHEMBL6559871 | 0.77 | THRB (0.32) | CD81THRBCYP2C9 | |
| Methacrylic Acid SCHEMBL28235913 | 0.71 | HSD11B1 (0.33) | KMT2ASMN1; SMN2 | |
| SCHEMBL1937747 | 0.70 | GRIN2D (0.32) | — | |
| SCHEMBL31160481 | 0.70 | KMT2A (0.35) | KMT2ASMN1; SMN2 | |
| SCHEMBL7523676 | 0.69 | KMT2A (0.32) | KMT2ASMN1; SMN2 | |
| SCHEMBL244479 | 0.68 | HSD11B1 (0.38) | THRBCYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | disclosed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | disclosed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | disclosed |
| US-8115036-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-14 | — | — | US | disclosed |
| US-20100204422-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100196825-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | US | disclosed |
| WO-2010086288-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS AND METHOD OF FORMING A PATTERN USING IT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | WO | disclosed |
| US-7736835-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-06-15 | — | — | US | disclosed |
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |
| US-20090042148-A1 | Photoresist Composition for Deep UV and Process Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-12 | — | — | US | disclosed |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-01-03 | — | — | US | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100204422-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | AFF1, AFF2, FGFR1 | CD81 2138/4885THRB 3200/4885CYP2C9 1871/4885 |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | AFF1, AFF2, FGFR1 | CD81 2138/4885THRB 3200/4885CYP2C9 1871/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.