Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL595458 | 0.88 | CD81 (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL1089320 | 0.80 | THRB (0.33) | CD81THRBCYP2C9 | |
| SCHEMBL596454 | 0.80 | CD81 (0.34) | CD81THRBCYP2C9 | |
| SCHEMBL6559871 | 0.77 | THRB (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL14786479 | 0.69 | ALDH1A1 (0.36) | — | |
| SCHEMBL7521808 | 0.69 | — | — | |
| SCHEMBL244479 | 0.68 | HSD11B1 (0.38) | THRBCYP2C9 | |
| SCHEMBL9649905 | 0.68 | HSD11B1 (0.38) | THRBCYP2C9 | |
| SCHEMBL4579253 | 0.65 | TSHR (0.33) | — | |
| SCHEMBL1088145 | 0.65 | HSD11B1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | claimed |
| US-8304178-B2 | Top antireflective coating composition containing hydrophobic and acidic groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-06 | — | — | US | disclosed |
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | disclosed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | disclosed |