Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 2/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | APLNR | P35414 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6559871 | 0.84 | THRB (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL1089320 | 0.83 | THRB (0.33) | CD81THRBCYP2C9MAPTEPHX1 | |
| SCHEMBL4579253 | 0.80 | TSHR (0.33) | — | |
| SCHEMBL3207202 | 0.80 | CD81 (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL595458 | 0.80 | CD81 (0.32) | CD81THRBCYP2C9 | |
| SCHEMBL7523126 | 0.78 | THRB (0.30) | THRBCYP2C9 | |
| SCHEMBL157720 | 0.71 | THRB (0.39) | CD81THRBCYP2C9APLNREPHX1 | |
| SCHEMBL244479 | 0.71 | HSD11B1 (0.38) | THRBCYP2C9MAPT | |
| SCHEMBL757168 | 0.71 | THRB (0.39) | CD81THRBCYP2C9APLNREPHX1 | |
| SCHEMBL9649905 | 0.71 | HSD11B1 (0.38) | THRBCYP2C9MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| US-20210294148-A1 | Planarizing Organic Films | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | US | disclosed |
| WO-2021188352-A1 | PLANARIZING ORGANIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | WO | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-11016388-B2 | Overcoat compositions and methods for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-05-25 | — | — | US | disclosed |
| US-10558122-B2 | Compositions comprising sulfonamide material and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2020-02-11 | — | — | US | disclosed |
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| US-20030013049-A1 | Photoacid generator systems for short wavelength imaging | SHIPLEY COMPANY, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| US-6482567-B1 | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-11-19 | — | — | US | disclosed |
| WO-2002069040-A1 | NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, LLC (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002069039-A2 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |
| US-20020058198-A1 | Fluorinated phenolic polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| WO-2002017019-A2 | OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-02-28 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11016388-B2 | Overcoat compositions and methods for photolithography | OGT, COLGALT1, PARG | CD81 2496/4885THRB 4598/4885CYP2C9 1259/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.