Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.36 |
| ▸ | PDE4A | P27815 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16499985 | 0.97 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL16500026 | 0.97 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL10484655 | 0.95 | APP (0.44) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL518982 | 0.95 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL856905 | 0.92 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL220968 | 0.92 | APP (0.50) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL1258894 | 0.90 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL10484571 | 0.90 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL1646543 | 0.90 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL21808785 | 0.90 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110684995-A | Electroplating leveling agent and electroplating solution thereof | 深圳海恩特科技有限公司 | 2020-01-14 | — | — | CN | claimed |
| EP-1856167-B1 | Acidic solution containing a polyvinylammonium compound and method of electrolytically depositing a copper deposit | ATOTECH DEUTSCHLAND GMBH (DE) | 2015-05-06 | — | — | EP | disclosed |
| US-8114263-B2 | Provides additives allowing for reproducibly manufacturing particularly bright, i.e., mirror-polished, as well as well leveled and ductile copper coatings; allows for even the smallest holes in the surface of the workpiece to be filled; copper deposit is uniformly produced | ATOTECH DEUTSCHLAND GMBH (DE) | 2012-02-14 | — | — | US | disclosed |
| US-7872130-B2 | Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit | ATOTECH DEUTSCHLAND GMBH (DE) | 2011-01-18 | — | — | US | disclosed |
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | disclosed |
| EP-1592825-B1 | MIXTURE OF OLIGOMERIC PHENAZINIUM COMPOUNDS AND ACID BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT | ATOTECH DEUTSCHLAND GMBH (DE) | 2009-03-25 | — | — | EP | disclosed |
| US-20080210569-A1 | Polyvinylammonium Compound, Method of Manufacturing Same, Acidic Solution Containing Said Compound and Method of Electrolytically Depositing a Copper Deposit | ATOTECH USA, LLC | 2008-09-04 | — | — | US | disclosed |
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | disclosed |
| EP-1856167-A1 | POLYVINYLAMMONIUM COMPOUND, METHOD OF MANUFACTURING SAME, ACIDIC SOLUTION CONTAINING SAID COMPOUND AND METHOD OF ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT | ATOTECH Deutschland GmbH (DE) | 2007-11-21 | — | — | EP | disclosed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | disclosed |
| US-20060226021-A1 | Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit | ATOTECH USA, LLC | 2006-10-12 | — | — | US | disclosed |
| WO-2006094755-A1 | POLYVINYLAMMONIUM COMPOUND, METHOD OF MANUFACTURING SAME, ACIDIC SOLUTION CONTAINING SAID COMPOUND AND METHOD OF ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-09-14 | — | — | WO | disclosed |
| EP-1592825-A1 | MIXTURE OF OLIGOMERIC PHENAZINIUM COMPOUNDS AND ACID BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT | ATOTECH Deutschland GmbH (DE) | 2005-11-09 | — | — | EP | disclosed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | disclosed |
| WO-2004057061-A1 | MIXTURE OF OLIGOMERIC PHENAZINIUM COMPOUNDS AND ACID BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT | ATOTECH DEUTSCHLAND GMBH (DE) | 2004-07-08 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060226021-A1 | Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit | PICALM, ATP1A2, RAB5IF | APP 219/4885PTGS1 4598/4885PDE4A 3058/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.