Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KCNJ1 | P48048 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.35 |
| ▸ | ERN1 | O75460 | 3/20 | 0.34 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | TYR | P14679 | 2/20 | 0.31 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.31 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.31 |
| ▸ | GFER | P55789 | 1/20 | 0.31 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.31 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.31 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.30 |
| ▸ | HCRTR2 | O43614 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyanide SCHEMBL28314183 | 0.94 | KCNJ1 (0.36) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL29818681 | 0.84 | ALDH1A1 (0.50) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL4353272 | 0.84 | ALDH1A1 (0.50) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL6258536 | 0.79 | ALDH1A1 (0.48) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL21218770 | 0.76 | ACHE (0.33) | TSHRTDP1 | |
| SCHEMBL28669143 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL366594 | 0.75 | ALDH1A1 (0.48) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL6015156 | 0.74 | ALDH1A1 (0.43) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| Hydrochloric Acid SCHEMBL28212658 | 0.73 | ALDH1A1 (0.46) | ALDH1A1TSHRKCNJ1TDP1MEN1 | |
| SCHEMBL77591 | 0.71 | TSHR (0.40) | ALDH1A1TSHRKCNJ1TDP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-10-25 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-3279728-B1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-17 | — | — | EP | disclosed |
| CN-107428646-B | Compounds, resins, and methods for their purification, and uses thereof | 三菱瓦斯化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10816898-B2 | — | — | 2020-10-27 | — | — | US | disclosed |
| US-10747112-B2 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| EP-3279190-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-9122153-B2 | Cyclic compound, method for producing same, composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-20140308615-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-10-16 | — | — | US | disclosed |
| EP-2743249-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-6984740-B2 | Symmetrical halogenated and alkylated alditol derivatives and compositions and articles containing same | MILLIKEN & COMPANY (US) | 2006-01-10 | — | — | US | disclosed |
| EP-1425342-A4 | NOVEL SYMMETRICAL SUBSTITUTED BENZALDEHYDE ALDITOL DERIVATIVES AND COMPOSITIONS AND ARTICLES CONTAINING SAME | MILLIKEN & CO (US) | 2005-01-05 | — | — | EP | disclosed |
| EP-1425342-A2 | NOVEL SYMMETRICAL SUBSTITUTED BENZALDEHYDE ALDITOL DERIVATIVES AND COMPOSITIONS AND ARTICLES CONTAINING SAME | Milliken & Company (US) | 2004-06-09 | — | — | EP | disclosed |
| US-20030127631-A1 | Novel symmetrical halogenated and alkylated alditol derivatives and compositions and articles containing same | ANDERSON JOHN D (US) | 2003-07-10 | — | — | US | disclosed |
| US-6547988-B2 | Plastic additives which are useful as nucleating agents and which are especially useful for improving the optical properties of polymeric materials; also useful as gelling agents for water and organic solvents | MILLIKEN & COMPANY | 2003-04-15 | — | — | US | disclosed |
| US-20030008951-A1 | Novel symmetrical halogenated and alkylated alditol derivatives and compositions and articles containing same | MILLIKEN & COMPANY | 2003-01-09 | — | — | US | disclosed |
| WO-2002077086-A2 | NOVEL SYMMETRICAL SUBSTITUTED BENZALDEHYDE ALDITOL DERIVATIVES AND COMPOSITIONS AND ARTICLES CONTAINING SAME | MILLIKEN & COMPANY (US) | 2002-10-03 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | SLC11A2, ABCC1, FBL | ALDH1A1 1809/4885TSHR 4741/4885KCNJ1 1572/4885 |
| US-20030008951-A1 | Novel symmetrical halogenated and alkylated alditol derivatives and compositions and articles containing same | ADH1C, ADH1A, ALDOA | ALDH1A1 69/4885TSHR 2045/4885KCNJ1 1516/4885 |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | C9, C1R, RAD51 | ALDH1A1 1553/4885TSHR 1302/4885KCNJ1 1173/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885TSHR 1292/4885KCNJ1 1282/4885 |
| US-10747112-B2 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | C5, PRMT9, C9 | ALDH1A1 1890/4885TSHR 464/4885KCNJ1 182/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885TSHR 1292/4885KCNJ1 1282/4885 |
| US-10816898-B2 | — | C5, C9, H1-0 | ALDH1A1 135/4885TSHR 2223/4885KCNJ1 4047/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.