Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | KCNJ1 | P48048 | 1/20 | 0.42 |
| ▸ | ERN1 | O75460 | 5/20 | 0.40 |
| ▸ | TRIM24 | O15164 | 3/20 | 0.40 |
| ▸ | TRIM33 | Q9UPN9 | 3/20 | 0.40 |
| ▸ | TLR2 | O60603 | 1/20 | 0.38 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.38 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.38 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.36 |
| ▸ | HCRTR2 | O43614 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2451551 | 0.83 | ALDH1A1 (0.59) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL6015155 | 0.79 | ALDH1A1 (0.39) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL97071 | 0.78 | — | — | |
| SCHEMBL29661768 | 0.78 | — | — | |
| SCHEMBL16953898 | 0.77 | APP (0.32) | — | |
| SCHEMBL10459304 | 0.77 | ALDH1A1 (0.38) | ALDH1A1TDP1 | |
| SCHEMBL15789547 | 0.77 | ALDH1A1 (0.43) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL29444 | 0.76 | TSHR (0.65) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL14876837 | 0.76 | LMNA (0.50) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL29661859 | 0.76 | LMNA (0.50) | ALDH1A1TSHRMEN1LMNATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-10-25 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-3279728-B1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-17 | — | — | EP | disclosed |
| CN-107428646-B | Compounds, resins, and methods for their purification, and uses thereof | 三菱瓦斯化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10816898-B2 | — | — | 2020-10-27 | — | — | US | disclosed |
| US-10747112-B2 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| EP-3279190-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20130253064-A1 | STYRENYL DERIVATIVE COMPOUNDS FOR TREATING OPHTHALMIC DISEASES AND DISORDERS | ACUCELA INC. | 2013-09-26 | — | — | US | disclosed |
| US-8420863-B2 | Styrenyl derivative compounds for treating ophthalmic diseases and disorders | ACUCELA, INC. (US) | 2013-04-16 | — | — | US | disclosed |
| US-8420863-B2 | Styrenyl derivative compounds for treating ophthalmic diseases and disorders | ACUCELA, INC. (US) | 2013-04-16 | — | — | US | disclosed |
| US-20120129860-A1 | STYRENYL DERIVATIVE COMPOUNDS FOR TREATING OPHTHALMIC DISEASES AND DISORDERS | ACUCELA, INC. (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120129860-A1 | STYRENYL DERIVATIVE COMPOUNDS FOR TREATING OPHTHALMIC DISEASES AND DISORDERS | ACUCELA, INC. (US) | 2012-05-24 | — | — | US | disclosed |
| US-20090170841-A1 | Styrenyl Derivative Compounds for Treating Ophthalmic Diseases and Disorders | ACUCELA INC. (US) | 2009-07-02 | — | — | US | disclosed |
| US-20090170841-A1 | Styrenyl Derivative Compounds for Treating Ophthalmic Diseases and Disorders | ACUCELA INC. (US) | 2009-07-02 | — | — | US | disclosed |
| US-20050124683-A1 | HIV protease inhibitors, compositions containing the same, their pharmaceutical uses and materials for their synthesis | AGOURON PHARMACEUTICALS, INC. | 2005-06-09 | — | — | US | disclosed |
| WO-2005026114-A1 | HIV PROTEASE INHIBITORS, COMPOSITIONS CONTAINING THE SAME AND THEIR PHARMACEUTICAL USES | PFIZER INC. (US) | 2005-03-24 | — | — | WO | disclosed |
| WO-2005026114-A1 | HIV PROTEASE INHIBITORS, COMPOSITIONS CONTAINING THE SAME AND THEIR PHARMACEUTICAL USES | PFIZER INC. (US) | 2005-03-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | SLC11A2, ABCC1, FBL | ALDH1A1 1809/4885TSHR 4741/4885MEN1 3872/4885 |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | C9, C1R, RAD51 | ALDH1A1 1553/4885TSHR 1302/4885MEN1 1579/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885TSHR 1292/4885MEN1 1512/4885 |
| US-20120129860-A1 | STYRENYL DERIVATIVE COMPOUNDS FOR TREATING OPHTHALMIC DISEASES AND DISORDERS | ALDH1A2, STARD3, TXNRD2 | ALDH1A1 336/4885TSHR 1547/4885MEN1 4617/4885 |
| US-20130253064-A1 | STYRENYL DERIVATIVE COMPOUNDS FOR TREATING OPHTHALMIC DISEASES AND DISORDERS | ALDH1A2, STARD3, TXNRD2 | ALDH1A1 336/4885TSHR 1547/4885MEN1 4617/4885 |
| US-10747112-B2 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | C5, PRMT9, C9 | ALDH1A1 1890/4885TSHR 464/4885MEN1 977/4885 |
| US-20050124683-A1 | HIV protease inhibitors, compositions containing the same, their pharmaceutical uses and materials for their synthesis | PEPD, SERPINB1, ACE | ALDH1A1 3125/4885TSHR 4876/4885MEN1 3684/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885TSHR 1292/4885MEN1 1512/4885 |
| US-20090170841-A1 | Styrenyl Derivative Compounds for Treating Ophthalmic Diseases and Disorders | ALDH1A2, STARD3, TXNRD2 | ALDH1A1 336/4885TSHR 1547/4885MEN1 4617/4885 |
| US-10816898-B2 | — | C5, C9, H1-0 | ALDH1A1 135/4885TSHR 2223/4885MEN1 2964/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.