Known targets — ChEMBL curated mechanism
DHFRGARTPTGFRPTGIRPTGS1PTGS2TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8envmurAthyA
The experimentally established mechanism targets of Tromethamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 6/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | USP2 | O75604 | 4/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6131221 | 0.84 | TDP1 (0.48) | TDP1LMNAMEN1KMT2AMAPT | |
| SCHEMBL304203 | 0.78 | TDP1 (0.54) | TDP1LMNAMEN1KMT2AMAPT | |
| SCHEMBL15096923 | 0.75 | ALDH1A1 (0.50) | TDP1LMNAMEN1KMT2AMAPT | |
| Tromethamine SCHEMBL6569887 | 0.74 | LMNA (0.48) | LMNAMEN1KMT2AALDH1A1USP2 | |
| SCHEMBL17480802 | 0.74 | TDP1 (0.48) | TDP1LMNAMEN1KMT2AMAPT | |
| SCHEMBL17482276 | 0.74 | PRKCA (0.49) | TDP1LMNAMEN1KMT2AKDM4E | |
| SCHEMBL14528315 | 0.73 | HSD17B10 (0.50) | TDP1LMNAMEN1KMT2AMAPT | |
| Hydroquinone SCHEMBL6353777 | 0.73 | ADRB2 (0.46) | TDP1LMNAMEN1KMT2AMAPT | |
| SCHEMBL22985141 | 0.72 | LMNA (0.50) | TDP1LMNAMEN1KMT2AMAPT | |
| Tromethamine SCHEMBL4431533 | 0.72 | LMNA (0.46) | LMNAMEN1KMT2AALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1290058-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC. (US) | 2003-03-12 | — | — | EP | claimed |
| WO-2001088013-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC (US) | 2001-11-22 | — | — | WO | claimed |
| CN-113805435-B | Photoresist and method | 台湾积体电路制造股份有限公司 | 2024-05-28 | — | — | CN | disclosed |
| CN-116009357-A | Methods and compositions for improving photoresist patterning | 台湾积体电路制造股份有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-115494698-A | Method for manufacturing semiconductor device and photoresist | 台湾积体电路制造股份有限公司 | 2022-12-20 | — | — | CN | disclosed |
| CN-110660650-B | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-113805435-A | Photoresist and method | 台湾积体电路制造股份有限公司 | 2021-12-17 | — | — | CN | disclosed |
| CN-112305861-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-02-02 | — | — | CN | disclosed |
| CN-111863601-A | Method for manufacturing semiconductor device and photoresist | 台湾积体电路制造股份有限公司 | 2020-10-30 | — | — | CN | disclosed |
| CN-105093826-B | Photoresist and method | 台湾积体电路制造股份有限公司 | 2020-01-14 | — | — | CN | disclosed |
| CN-110660650-A | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2020-01-07 | — | — | CN | disclosed |
| EP-1290058-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC. (US) | 2003-03-12 | — | — | EP | disclosed |
| WO-2001088013-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC (US) | 2001-11-22 | — | — | WO | disclosed |