SCHEMBL6233438

SCHEMBL6233438

CCC(C)OC(=O)C(=Cc1ccc(N(C)C)cc1)C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.45
ALDH1A1 P00352 4/20 0.45
MAPT P10636 3/20 0.45
LMNA P02545 2/20 0.45
GAA P10253 1/20 0.45
IDE P14735 2/20 0.43
PTGS1 P23219 2/20 0.40
PTGS2 P35354 2/20 0.40
NQO2 P16083 1/20 0.40
MEN1 O00255 5/20 0.39
MAOB P27338 1/20 0.39
RAB9A P51151 1/20 0.39
PSMD14 O00487 1/20 0.39
APP P05067 1/20 0.39
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6229330 0.85 APP (0.52) KMT2AALDH1A1MAPTPTGS1MEN1
SCHEMBL435678 0.85 KDM4E (0.46) KMT2AALDH1A1MAPTLMNAPTGS2
SCHEMBL3224035 0.85 MEN1 (0.55) KMT2AALDH1A1MAPTLMNAMEN1
SCHEMBL3218589 0.84 MEN1 (0.55) KMT2AALDH1A1MAPTLMNAPTGS2
SCHEMBL1673522 0.84 KMT2A (0.55) KMT2AALDH1A1MAPTLMNAGAA
SCHEMBL11815879 0.84 GRIK1 (0.42) KMT2AALDH1A1MAPTLMNAMEN1
SCHEMBL1332953 0.83 TAS1R3 (0.42) KMT2AALDH1A1MAPTLMNAMEN1
SCHEMBL8577901 0.83 TP53 (0.58) KMT2AALDH1A1MAPTLMNAMEN1
SCHEMBL28367377 0.81 KMT2A (0.62) KMT2AALDH1A1MAPTLMNAGAA
SCHEMBL1856660 0.80 PTGS2 (0.43) KMT2AALDH1A1MAPTLMNAPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1553449-B1 ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM MURAKAMI CO LTD (JP) 2016-01-20 EP disclosed
US-20050227166-A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film MURAKAMI CO., LTD. (JP) 2005-10-13 US disclosed
EP-1553449-A1 ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM Murakami Co., Ltd. (JP) 2005-07-13 EP disclosed