Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL7059331 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL7035853 | 1.00 | — | — | |
| Fluoride SCHEMBL16824044 | 0.87 | — | — | |
| Fluoride SCHEMBL1949794 | 0.87 | — | — | |
| Fluoride Ion SCHEMBL27280150 | 0.87 | — | — | |
| Potassium Ion SCHEMBL122678 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL6175 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL552564 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL10979901 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL3038547 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3248 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118778-A1 | METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES INTO A SUBSTRATE, IN PARTICULAR INTO A SUBSTRATE FOR AN OPTICAL ELEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, AND PROCESSING SYSTEM THEREFOR, METHOD AND SUBSTRATE FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, AND SEMICONDUCTOR TECHNOLOGY APPARATUS | ZEISS CARL SMT GMBH (DE) | 2026-04-30 | — | — | US | claimed |
| US-12420361-B2 | Braze coating material with nickel core and coating and preparation method and braze coating method thereof | ZHENGZHOU RESEARCH INSTITUTE OF MECHANICAL ENGINEERING CO., LTD. (CN) | 2025-09-23 | — | — | US | claimed |
| CN-120192207-A | Preparation method of perfluoro-2, 3-dimethyl-2-pentene | 浙江蓝天环保高科技股份有限公司 | 2025-06-24 | — | — | CN | claimed |
| US-20250177408-A1 | INHIBITOR OF INTERACTION BETWEEN YAP/TAZ AND TEAD, PREPARATION THEREOF, PHARMACEUTICAL COMPOSITION THEREOF AND USE THEREOF | Etern Therapeutics Hongkong Limited (CN) | 2025-06-05 | — | — | US | claimed |
| CN-119566614-B | High-corrosion-resistance high-strength solder and preparation method thereof | 新乡市七星钎焊科技有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-118496847-B | High-brightness fluorescent powder and preparation method thereof | 江门市科恒实业股份有限公司 | 2025-05-20 | — | — | CN | claimed |
| CN-119956435-A | Simple production method of foam metal | 广州三孚新材料科技股份有限公司 | 2025-05-09 | — | — | CN | claimed |
| CN-119932656-A | Large-scale preparation method of ultrathin foam copper | 广州三孚新材料科技股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119874517-A | Preparation method and preparation device of ethyl difluoroacetate | 福建省龙德新能源有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-113825747-B | Fluorolactones and process for producing the same | 大金工业株式会社 | 2025-04-25 | — | — | CN | claimed |
| EP-0145978-B1 | NUCLEOSIDE PROCESS | Bristol-Myers Company (US) | 1989-04-19 | — | — | EP | claimed |
| US-4751291-A | Process for the preparation of glycosyl fluorides protected on the oxygen | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-06-14 | — | — | US | claimed |
| CN-87105080-A | Improve the method for semi-transparent polycrystal aluminium oxide arc-tube rate of finished products | — | 1988-03-09 | — | — | CN | claimed |
| EP-0230322-A2 | 2,6-Dideoxy-2-fluoro-L-talopyranose and derivates thereof and the production of these compounds | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1987-07-29 | — | — | EP | claimed |
| EP-0215376-A2 | Method for the preparation of O-protected glycosyl fluorides | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-03-25 | — | — | EP | claimed |
| US-4220486-A | CORROSION RESISTANCE, CONTAINS STANNOUS FLUORIDE AND ALKALI HYDROGEN PHOSPHATES | NIHON PARKERIZING CO., LTD. (JP) | 1980-09-02 | — | — | US | claimed |
| US-4208254-A | ACIDIC BATH CONTAINING A FLUORIDE, BOROFLUORIDE OR SILICOFLUROIDE TO IMPROVE STABILITY AND LESSEN ELECTRODEPOSITION STRAIN | ICHIOKA SATOSHI | 1980-06-17 | — | — | US | claimed |
| US-4179465-A | N-fluoromethyl-carbamic acid fluorides and their manufacture | BASF AKTIENGESELLSCHAFT (DE) | 1979-12-18 | — | — | US | claimed |
| US-4040846-A | Optical fluorophosphate glass and process of making same | ERNST LEITZ G.M.B.H. (DT) | 1977-08-09 | — | — | US | claimed |
| US-3983012-A | Epitaxial growth of silicon or germanium by electrodeposition from molten salts | THE BOARD OF TRUSTEES OF LELAND STANFORD JUNIOR UNIVERSITY (US) | 1976-09-28 | — | — | US | claimed |