SCHEMBL6337405

SCHEMBL6337405

Cc1ccc(S(=O)(=O)OC(c2ccccc2)S(=O)(=O)O)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.46
CYP2D6 P10635 1/20 0.46
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 1/20 0.42
MAPT P10636 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
PKM P14618 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
VDR P11473 1/20 0.42
HTT P42858 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
LMNA P02545 3/20 0.40
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
C5AR1 P21730 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16377449 0.81 VDR (0.47) MAPK1CYP2D6PKMMEN1KMT2A
SCHEMBL9475352 0.80 VDR (0.46) MAPK1CYP2D6KDM4EALDH1A1TDP1
SCHEMBL6762680 0.80 VDR (0.46) MAPK1CYP2D6KDM4EALDH1A1TDP1
SCHEMBL11988007 0.79 VDR (0.45) MAPK1CYP2D6KDM4EALDH1A1MAPT
SCHEMBL491994 0.79 VDR (0.45) MAPK1CYP2D6KDM4EALDH1A1MAPT
SCHEMBL10970992 0.78 MAPK1 (0.43) MAPK1CYP2D6KDM4EALDH1A1MAPT
SCHEMBL11260413 0.78 KEAP1 (0.46) MAPK1CYP2D6ALDH1A1TDP1PKM
SCHEMBL6982213 0.77 GSR (0.46) MAPK1CYP2D6ALDH1A1PKMVDR
SCHEMBL17164172 0.77 GSR (0.46) MAPK1CYP2D6ALDH1A1PKMVDR
SCHEMBL4025136 0.76 LMNA (0.48) MAPK1CYP2D6ALDH1A1MAPTPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6869744-B2 Chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-22 US disclosed
US-20020042017-A1 Chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-11 US disclosed