Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5697624 | 0.78 | EPHX2 (0.39) | EPHX2HSD11B1 | |
| SCHEMBL5568128 | 0.72 | MAPK1 (0.39) | EPHX2HSD11B1 | |
| SCHEMBL692382 | 0.71 | ALDH1A1 (0.38) | EPHX2 | |
| SCHEMBL13325141 | 0.70 | POLB (0.38) | HSD11B1 | |
| SCHEMBL5562876 | 0.69 | MEN1 (0.35) | EPHX2 | |
| SCHEMBL7889206 | 0.69 | EPHX2 (0.40) | EPHX2 | |
| SCHEMBL5568216 | 0.68 | L3MBTL1 (0.37) | EPHX2 | |
| SCHEMBL5568688 | 0.68 | MEN1 (0.35) | EPHX2 | |
| SCHEMBL6345863 | 0.68 | EPHX2 (0.33) | EPHX2 | |
| SCHEMBL28479907 | 0.67 | KMT2A (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |