Water

Water

SCHEMBL6366168

CCN(C)CC.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1363064 0.95
SCHEMBL16152 0.95
Hydrochloric Acid SCHEMBL1727088 0.90
SCHEMBL19279014 0.90
Hydrochloric Acid SCHEMBL11465106 0.90
Iodide SCHEMBL6269430 0.90
SCHEMBL17046204 0.90
SCHEMBL1191700 0.90 MGLL (0.31)
SCHEMBL19279016 0.90
SCHEMBL15208800 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101830811-A Preparation method of 4-aminodiphenylamine JIANGSU YANGNONG CHEMICAL GROUP CO LTD 2010-09-15 CN claimed
US-20250243078-A1 ELECTROLUMINESCENT DIODE, AND DISPLAY DEVICE INCLUDING SAME SAMSUNG DISPLAY CO., LTD. (KR) 2025-07-31 US disclosed
EP-4593566-A1 ELECTROLUMINESCENT DIODE, AND DISPLAY DEVICE INCLUDING SAME Samsung Electronics Co., Ltd. (KR) 2025-07-30 EP disclosed
US-20240286088-A1 ZEOLITE MEMBRANE COMPLEX, MEMBRANE REACTOR, AND METHOD OF PRODUCING ZEOLITE MEMBRANE COMPLEX NGK INSULATORS, LTD. (JP) 2024-08-29 US disclosed
US-20240191360-A1 CHEMICAL SOLUTION FOR REMOVING PRECIOUS METAL, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, METHOD FOR TREATING SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2024-06-13 US disclosed
CN-111960433-A CHA type molecular sieve synthesized by using bicyclic group-containing quaternary ammonium onium template agent, and preparation and application of catalyst 中触媒新材料股份有限公司 2020-11-20 CN disclosed
CN-105983437-A Catalyst containing MWW-structured molecular sieve as well as preparation method and application of catalyst 中国石油化工股份有限公司 2016-10-05 CN disclosed
CN-101830811-B Preparation method of 4-aminodiphenylamine JIANGSU YANGNONG CHEMICAL GROUP CO LTD 2013-04-03 CN disclosed
CN-101830811-A Preparation method of 4-aminodiphenylamine JIANGSU YANGNONG CHEMICAL GROUP CO LTD 2010-09-15 CN disclosed
CN-101717339-A Double quaternary ammonium base compound and preparation method as well as application thereof JIANGSU YANGNONG CHEMICAL GROU 2010-06-02 CN disclosed
CN-100559287-C The photoresist release agent compositions TOTOMO FINE CHEM CO LTD (KR) 2009-11-11 CN disclosed
US-20050287480-A1 Photoresist stripper composition DONGWOO FINE-CHEM CO., LTD. (KR) 2005-12-29 US disclosed
CN-1677248-A Photoresist stripping agent composition TOTOMO FINE CHEM CO LTD (KR) 2005-10-05 CN disclosed
EP-0260104-A2 Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene CELANESE CORPORATION (US) 1988-03-16 EP disclosed