SCHEMBL647362

SCHEMBL647362

COc1cc(C=CC(=O)OC(C)CC[Si](C)(O[Si](C)(C)C)O[Si](C)(C)C)cc(OC)c1OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.47
KDM4E B2RXH2 5/20 0.47
HTR1A P08908 4/20 0.47
HPGD P15428 3/20 0.47
HTR2C P28335 3/20 0.47
GAA P10253 1/20 0.47
HTT P42858 1/20 0.47
HSD17B10 Q99714 1/20 0.47
LMNA P02545 5/20 0.46
L3MBTL1 Q9Y468 1/20 0.44
PSMB11 A5LHX3 1/20 0.44
PSMA7 O14818 1/20 0.44
PSMB1 P20618 1/20 0.44
PSMA1 P25786 1/20 0.44
PSMA2 P25787 1/20 0.44
PSMA3 P25788 1/20 0.44
PSMA4 P25789 1/20 0.44
PSMB8 P28062 1/20 0.44
PSMB9 P28065 1/20 0.44
PSMA5 P28066 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9119856 0.88 NFE2L2 (0.50) ALDH1A1KDM4EHPGDHTTHSD17B10
SCHEMBL645500 0.81 ABCB1 (0.56) ALDH1A1KDM4EHTR1AHPGDHTR2C
SCHEMBL527317 0.80 ABCB1 (0.51) ALDH1A1KDM4EHTR1AHPGDHTR2C
SCHEMBL527316 0.80 ABCB1 (0.51) ALDH1A1KDM4EHTR1AHPGDHTR2C
SCHEMBL6698837 0.80 ALDH1A1 (0.44) ALDH1A1KDM4EHTR1AHPGDHTR2C
SCHEMBL20335193 0.80 ALDH1A1 (0.44) ALDH1A1KDM4EHTR1AHPGDHTR2C
SCHEMBL9440564 0.80 ABCB1 (0.58) ABCB1ABCG2ABCC1
SCHEMBL25329704 0.79 NFE2L2 (0.50) ALDH1A1KDM4EHPGDHTTHSD17B10
SCHEMBL646207 0.79 NFE2L2 (0.50) ALDH1A1KDM4EHPGDHTTHSD17B10
SCHEMBL29579523 0.79 NFE2L2 (0.50) ALDH1A1KDM4EHPGDHTTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2167291-A None JP disclosed
US-12383476-B2 W/O/W emulsion composition SHISEIDO COMPANY, LTD. (JP) 2025-08-12 US disclosed
WO-2024142969-A1 WATER-IN-OIL EMULSION COMPOSITION 株式会社 資生堂 2024-07-04 WO disclosed
US-20240139085-A1 SURFACE-MODIFIED ZINC OXIDE PARTICLES, DISPERSION LIQUID, COSMETIC PREPARATION, AND METHOD FOR PRODUCING SURFACE-MODIFIED ZINC OXIDE PARTICLES SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2024-05-02 US disclosed
WO-2024080367-A1 POLYSILOXANE-COATED METAL OXIDE PARTICLES, DISPERSION LIQUID, COMPOSITION, COSMETIC, AND METHOD FOR PRODUCING POLYSILOXANE-COATED METAL OXIDE PARTICLES 住友大阪セメント株式会社 2024-04-18 WO disclosed
EP-4296232-A1 SURFACE-MODIFIED ZINC OXIDE PAPRTICLES, DISPERSION LIQUID, COSMETIC PREPARATION, AND METHOD FOR PRODUCING SURFACE-MODIFIED ZINC OXIDE PARTICLES Sumitomo Osaka Cement Co., Ltd. (JP) 2023-12-27 EP disclosed
WO-2023210618-A1 SURFACE-TREATED ZINC OXIDE PARTICLES, DISPERSION LIQUID, COSMETIC MATERIAL, METHOD FOR PRODUCING SURFACE-TREATED ZINC OXIDE PARTICLES 住友大阪セメント株式会社 2023-11-02 WO disclosed
WO-2023190487-A1 SURFACE-MODIFIED ZINC OXIDE PARTICLES, DISPERSION LIQUID AND COSMETIC PREPARATION 住友大阪セメント株式会社 2023-10-05 WO disclosed
EP-4253323-A1 ZINC OXIDE POWDER, DISPERSION LIQUID, COATING MATERIAL, AND COSMETIC Sumitomo Osaka Cement Co., Ltd. (JP) 2023-10-04 EP disclosed
EP-4253322-A1 ZINC OXIDE POWDER, LIQUID DISPERSION, COATING MATERIAL, AND COSMETIC Sumitomo Osaka Cement Co., Ltd. (JP) 2023-10-04 EP disclosed
US-20160221835-A1 ZINC OXIDE POWDER, DISPERSION, PAINT, AND COSMETIC MATERIAL SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2016-08-04 US disclosed
US-9403691-B1 Zinc oxide powder, dispersion, paint, and cosmetic material SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2016-08-02 US disclosed
US-8119108-B2 Dispersion of microparticulate titanium oxide and cosmetics containing the same SHISEIDO CO., LTD. (JP) 2012-02-21 US disclosed
US-20040137019-A1 Cosmetic w/o/w emulsion preparation SHISEIDO COMPANY, LTD. (JP) 2004-07-15 US disclosed
EP-1369101-A1 COSMETIC W/O/W EMULSION PREPARATION SHISEIDO COMPANY LIMITED (JP) 2003-12-10 EP disclosed
EP-0350314-B1 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO CO LTD (JP) 1995-12-13 EP disclosed
US-5315022-A Sunscreen SHISEIDO COMPANY LTD. (JP) 1994-05-24 US disclosed
US-5093511-A SILICONE TYPE CINNAMIC ACID DERIVATIVE, PREPARATION METHOD THEREOF, UV-RAY ABSORBER, AND EXTERNAL SKIN TREATMENT AGENT SHISEIDO COMPANY, LTD. (JP) 1992-03-03 US disclosed
JP-H02167291-A SILICONE-BASED CINNAMIC ACID DERIVATIVE, PRODUCTION THEREOF AND ULTRAVIOLET LIGHT ABSORBER SHISEIDO CO LTD 1990-06-27 JP disclosed
EP-0350314-A2 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO COMPANY LIMITED (JP) 1990-01-10 EP disclosed