SCHEMBL6536372

SCHEMBL6536372

C=Cc1ccc(OCCOCc2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 4/20 0.46
CHRNB4 P30926 3/20 0.46
CHRNA3 P32297 3/20 0.46
CHRNB2 P17787 2/20 0.46
CHRNA4 P43681 2/20 0.46
LCK P06239 1/20 0.44
TSHR P16473 1/20 0.44
FOXM1 Q08050 1/20 0.44
LMNA P02545 1/20 0.43
CYP1A2 P05177 1/20 0.43
PTGS1 P23219 1/20 0.43
SLC6A2 P23975 1/20 0.43
CYP2C19 P33261 1/20 0.43
PTGS2 P35354 1/20 0.43
SLC6A3 Q01959 1/20 0.43
HIF1A Q16665 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
GSK3B P49841 1/20 0.43
BACE1 P56817 1/20 0.43
RAB9A P51151 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2267205 0.92 TDP1 (0.46) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL8160734 0.87 CHRNB2 (0.46) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL21244014 0.87 TSHR (0.47) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL763259 0.84 LMNA (0.60) LCKTSHRLMNACYP1A2PTGS1
SCHEMBL16594362 0.84 TSHR (0.56) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL3695404 0.84 CHRNA7 (0.56) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL4758428 0.84 SMN1; SMN2 (0.51) LCKTSHRFOXM1LMNAGSK3B
SCHEMBL19871639 0.83 MAOB (0.54) LCKTSHRRAB9ASMN1; SMN2NPC1
SCHEMBL5677947 0.83 LMNA (0.62) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL903883 0.82 TSHR (0.58) TSHRFOXM1LMNACYP1A2PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
US-20020058200-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-16 US disclosed