SCHEMBL6536620

SCHEMBL6536620

O=S(=O)(Cl)c1ccc(C(F)(F)F)c(C(F)(F)F)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 3/20 0.42
TRPV4 Q9HBA0 1/20 0.42
ALDH1A1 P00352 2/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MEP1B Q16820 1/20 0.38
TSHR P16473 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
FFAR1 O14842 1/20 0.36
FFAR4 Q5NUL3 1/20 0.36
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
CA12 O43570 1/20 0.36
CA4 P22748 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1942107 0.84 HSD11B1 (0.40) KIF11TRPV4MEP1BTSHRSMN1; SMN2
SCHEMBL1940543 0.84 KIF11 (0.56) KIF11TRPV4PTGS2PTGS1
SCHEMBL29669107 0.84 CCR2 (0.45) KIF11TRPV4HSD17B10FFAR1FFAR4
SCHEMBL67150 0.84 CCR2 (0.45) KIF11TRPV4HSD17B10FFAR1FFAR4
SCHEMBL127681 0.84 MEP1B (0.52) ALDH1A1HSD17B10MEP1BTSHRSMN1; SMN2
SCHEMBL29989656 0.84 MEP1B (0.52) ALDH1A1HSD17B10MEP1BTSHRSMN1; SMN2
SCHEMBL20752520 0.83 KIF11 (0.44) KIF11ALDH1A1MEP1BTSHRSMN1; SMN2
SCHEMBL1762440 0.82 KIF11 (0.39) KIF11TRPV4ALDH1A1TDP1MEP1B
SCHEMBL11776434 0.82 KIF11 (0.42) KIF11TRPV4ALDH1A1HSD17B10TDP1
SCHEMBL20870448 0.82 ESR1 (0.44) KIF11TRPV4MEP1BFFAR4POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103772252-B Onium salt compound, acid amplifier derived therefrom, and resist composition comprising same 锦湖石油化学株式会社 2017-01-11 CN disclosed
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
EP-1301480-A1 1,3-DISUBSTITUTED AND 1,3,3-TRISUBSTITUTED PYRROLIDINES AS HISTAMINE-3 RECEPTOR LIGANDS AND THEIR THERAPEUTIC APPLICATIONS ABBOTT LABORATORIES (US) 2003-04-16 EP disclosed
WO-2002006223-A1 1,3-DISUBSTITUTED AND 1,3,3-TRISUBSTITUTED PYRROLIDINES AS HISTAMINE-3 RECEPTOR LIGANDS AND THEIR THERAPEUTIC APPLICATIONS ABBOTT LABORATORIES (US) 2002-01-24 WO disclosed