SCHEMBL6550974

SCHEMBL6550974

CC(CS(=O)(=O)c1ccccc1)C(=O)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 8/20 0.49
MAPT P10636 2/20 0.47
PSIP1 O75475 1/20 0.47
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
RECQL P46063 2/20 0.45
PGR P06401 1/20 0.45
ADRA2A P08913 1/20 0.45
ADRA2B P18089 1/20 0.45
HTR2A P28223 1/20 0.45
HRH1 P35367 1/20 0.45
KCNH2 Q12809 1/20 0.45
ALDH1A1 P00352 3/20 0.43
LMNA P02545 1/20 0.43
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
ATM Q13315 1/20 0.42
TP53 P04637 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9626716 0.87 HSD11B1 (0.62) HSD11B1MAPTMEN1KMT2AALDH1A1
SCHEMBL7365625 0.84 PSIP1 (0.52) HSD11B1MAPTPSIP1MEN1KMT2A
SCHEMBL9772331 0.84 PGR (0.49) MAPTKMT2APGRADRA2AADRA2B
SCHEMBL8049080 0.82 PGR (0.47) MAPTKMT2APGRADRA2AADRA2B
SCHEMBL7370842 0.81 PSIP1 (0.48) HSD11B1MAPTPSIP1MEN1KMT2A
SCHEMBL23245793 0.79 MMP13 (0.52) HSD11B1MAPTRECQLALDH1A1TP53
SCHEMBL9218545 0.78 POLB (0.47) HSD11B1PSIP1MEN1KMT2A
SCHEMBL8414713 0.78 POLB (0.47) HSD11B1PSIP1MEN1KMT2A
SCHEMBL7141503 0.77 PSIP1 (0.48) HSD11B1MAPTPSIP1MEN1KMT2A
SCHEMBL7135389 0.77 PSIP1 (0.48) HSD11B1MAPTPSIP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115197108-B Preparation method of gamma-ketosulfone compound 南华大学 2023-11-28 CN disclosed
CN-115197108-A Preparation method of gamma-ketosulfone compound 南华大学 2022-10-18 CN disclosed
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
CN-1145078-C Polymer and resist material ������ҩ��ҵ��ʽ���� 2004-04-07 CN disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
CN-1159453-A Polymer and resist material WAKO PURE CHEM IND LTD (JP) 1997-09-17 CN disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed