SCHEMBL6552546

SCHEMBL6552546

O=C([O-])CS(=O)(=O)c1ccccc1.O=C([O-])CS(=O)(=O)c1ccccc1.[Ca+2]

nearest known ligand 0.63

Known targets — ChEMBL curated mechanism

GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP7 known ✓ P09237 2/20 0.63
MMP1 known ✓ P03956 1/20 0.56
MMP13 known ✓ P45452 1/20 0.56
MMP2 P08253 2/20 0.63
MMP14 P50281 2/20 0.63
HSD11B1 P28845 8/20 0.58
MMP3 P08254 1/20 0.56
MMP9 P14780 1/20 0.56
POLB P06746 2/20 0.52
KMT2A Q03164 1/20 0.51
RECQL P46063 1/20 0.51
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA9 Q16790 1/20 0.50
ALDH1A1 P00352 1/20 0.50
TP53 P04637 1/20 0.50
HTT P42858 1/20 0.50
HSD17B10 Q99714 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10712820 0.96 MMP2 (0.63) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL6553655 0.96 MMP2 (0.63) MMP2MMP7MMP14HSD11B1MMP1
Zinc Ion SCHEMBL6553415 0.96 MMP2 (0.63) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL6552241 0.96 MMP2 (0.63) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL6553659 0.96 MMP2 (0.63) MMP2MMP7MMP14HSD11B1MMP1
Tetramethylammonium Ion SCHEMBL2290151 0.90 HSD11B1 (0.58) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL8519852 0.82 MMP2 (0.49) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL6554020 0.82 NPC1 (0.67) MMP2MMP7MMP14HSD11B1MMP1
SCHEMBL270706 0.80 MMP2 (0.77) MMP2MMP7MMP14HSD11B1POLB
SCHEMBL23863544 0.78 HSD11B1 (0.62) MMP2MMP7MMP14HSD11B1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US claimed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP claimed
EP-1046496-B1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO LTD (JP) 2004-02-18 EP disclosed
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US disclosed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP disclosed