SCHEMBL6554020

SCHEMBL6554020

O=C([O-])CS(=O)(=O)c1ccc(Cl)cc1.O=C([O-])CS(=O)(=O)c1ccc(Cl)cc1.[Ca+2]

nearest known ligand 0.67

Known targets — ChEMBL curated mechanism

GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP7 known ✓ P09237 1/20 0.47
MMP1 known ✓ P03956 2/20 0.44
MMP8 known ✓ P22894 1/20 0.44
MMP13 known ✓ P45452 1/20 0.44
NPC1 O15118 1/20 0.67
ALDH1A1 P00352 4/20 0.61
KDM4E B2RXH2 1/20 0.61
HSD11B1 P28845 2/20 0.54
MMP2 P08253 2/20 0.47
MMP14 P50281 1/20 0.47
CYP3A4 P08684 1/20 0.46
MAPK1 P28482 1/20 0.46
KMT2A Q03164 1/20 0.45
CA1 P00915 3/20 0.44
CA2 P00918 3/20 0.44
MMP9 P14780 1/20 0.44
CA12 O43570 1/20 0.43
CA3 P07451 1/20 0.43
CA4 P22748 1/20 0.43
CA6 P23280 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6554000 0.96 NPC1 (0.67) NPC1ALDH1A1KDM4EHSD11B1MMP2
Tetramethylammonium Ion SCHEMBL8415515 0.91 NPC1 (0.61) NPC1ALDH1A1KDM4EHSD11B1MMP2
SCHEMBL6552546 0.82 MMP2 (0.63) ALDH1A1HSD11B1MMP2MMP7MMP14
SCHEMBL3671530 0.82 NPC1 (0.69) NPC1ALDH1A1KDM4EHSD11B1MMP2
SCHEMBL7401928 0.80 NPC1 (1.00) NPC1ALDH1A1KDM4EHSD11B1CYP3A4
SCHEMBL2027971 0.80 NPC1 (0.67) NPC1ALDH1A1KDM4EHSD11B1CYP3A4
SCHEMBL6554003 0.80 NPC1 (0.67) NPC1ALDH1A1KDM4EHSD11B1MMP2
SCHEMBL6554026 0.80 NPC1 (0.67) NPC1ALDH1A1KDM4EHSD11B1MMP2
SCHEMBL11106012 0.78 NPC1 (0.65) NPC1ALDH1A1KDM4EHSD11B1MMP2
SCHEMBL6203276 0.78 HSD11B1 (0.83) NPC1ALDH1A1KDM4EHSD11B1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US claimed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP claimed
EP-1046496-B1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO LTD (JP) 2004-02-18 EP disclosed
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US disclosed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP disclosed