Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6563570

O=S(=O)([O-])C(F)(F)F.Oc1ccc2c([S+]3CCCC3)cccc2c1

nearest known ligand 0.36

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HSD17B1 P14061 4/20 0.36
HSD17B2 P37059 4/20 0.36
KCNH2 Q12809 1/20 0.34
TRPV1 Q8NER1 2/20 0.33
ESR1 P03372 3/20 0.33
ESR2 Q92731 3/20 0.33
PSD A5PKW4 1/20 0.32
THRA P10827 1/20 0.32
THRB P10828 1/20 0.32
KCNJ11 Q14654 1/20 0.31
TLR8 Q9NR97 1/20 0.31
GPR3 P46089 1/20 0.30
MPL P40238 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6566258 0.90 TRPV1 (0.37) KCNH2TRPV1
Trifluoromethanesulfonic Acid SCHEMBL6014088 0.84 GPR3 (0.37) KCNH2GPR3
Trifluoromethanesulfonic Acid SCHEMBL6564719 0.82 MTNR1A (0.39) KCNH2
SCHEMBL6564762 0.82 KMT2A (0.38) HSD17B1HSD17B2ESR1ESR2THRB
Trifluoromethanesulfonic Acid SCHEMBL5483498 0.81 PTGS1 (0.35) KCNH2TRPV1ESR1ESR2
Trifluoromethanesulfonic Acid SCHEMBL29369242 0.81 PTGS1 (0.35) KCNH2TRPV1ESR1ESR2
Trifluoromethanesulfonic Acid SCHEMBL6566389 0.80 CDK2 (0.38) KCNH2ESR1ESR2KCNJ11GPR3
Trifluoromethanesulfonic Acid SCHEMBL6566405 0.79 ACHE (0.33) KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564004 0.79 GAA (0.39) KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564802 0.79 MTNR1A (0.36) KCNH2TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed