Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566258

O=S(=O)([O-])C(F)(F)F.Oc1ccc2cccc([S+]3CCCC3)c2c1

nearest known ligand 0.37

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TRPV1 Q8NER1 13/20 0.37
MCL1 Q07820 1/20 0.35
KDM4E B2RXH2 1/20 0.34
MEN1 O00255 1/20 0.34
MAPT P10636 1/20 0.34
RAB9A P51151 1/20 0.34
KMT2A Q03164 1/20 0.34
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
KCNH2 Q12809 1/20 0.34
HTR5A P47898 1/20 0.33
NQO2 P16083 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6563570 0.90 HSD17B1 (0.36) TRPV1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6014088 0.84 GPR3 (0.37) KDM4EMEN1KMT2AKCNH2
SCHEMBL6566360 0.82 HKDC1 (0.40) TRPV1MCL1MEN1KMT2AMTNR1A
Trifluoromethanesulfonic Acid SCHEMBL6566068 0.82 MTNR1A (0.42) TRPV1MTNR1AMTNR1BKCNH2
Trifluoromethanesulfonic Acid SCHEMBL5483498 0.81 PTGS1 (0.35) TRPV1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL29369242 0.81 PTGS1 (0.35) TRPV1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6566389 0.80 CDK2 (0.38) KDM4EMEN1RAB9AKMT2AKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6566367 0.79 MTNR1A (0.41) KDM4EMTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6562415 0.79 MTNR1A (0.35) TRPV1MTNR1AMTNR1BKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564870 0.79 MTNR1A (0.38) TRPV1MTNR1AMTNR1BNQO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed