Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6564802

COC(=O)Oc1ccc2c([S+]3CCCC3)cccc2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 6/20 0.36
MTNR1B P49286 5/20 0.36
NQO2 P16083 1/20 0.32
CYP2D6 P10635 1/20 0.32
MMP9 P14780 2/20 0.32
MMP2 P08253 1/20 0.32
MMP14 P50281 1/20 0.32
CASP6 P55212 1/20 0.32
PDE4B Q07343 1/20 0.32
KCNH2 Q12809 1/20 0.30
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6564870 0.92 MTNR1A (0.38) MTNR1AMTNR1BNQO2TRPV1
Trifluoromethanesulfonic Acid SCHEMBL6564628 0.91 MMP2 (0.35) MTNR1AMTNR1BMMP9MMP2MMP14
Trifluoromethanesulfonic Acid SCHEMBL6566103 0.90 CA2 (0.37) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6564556 0.89 CA2 (0.36) MTNR1AMTNR1BMMP9MMP2MMP14
Trifluoromethanesulfonic Acid SCHEMBL6564868 0.88 MMP2 (0.37) MTNR1AMTNR1BMMP9MMP2MMP14
Trifluoromethanesulfonic Acid SCHEMBL6564719 0.87 MTNR1A (0.39) MTNR1AMTNR1BNQO2KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564748 0.87 KMT2A (0.37) MTNR1AMTNR1BCYP2D6MMP9MMP2
Trifluoromethanesulfonic Acid SCHEMBL6564834 0.87 MTNR1A (0.32) MTNR1AMTNR1BCYP2D6KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6566405 0.84 ACHE (0.33) MTNR1AMTNR1BCYP2D6MMP9MMP2
Trifluoromethanesulfonic Acid SCHEMBL6566410 0.83 MMP2 (0.35) MTNR1AMTNR1BNQO2MMP9MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed