Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | MMP9 | P14780 | 1/20 | 0.37 |
| ▸ | MMP14 | P50281 | 1/20 | 0.37 |
| ▸ | MTNR1A | P48039 | 17/20 | 0.35 |
| ▸ | MTNR1B | P49286 | 8/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KLK7 | P49862 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6564791 | 0.95 | MTNR1A (0.37) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564868 | 0.93 | MMP2 (0.37) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6566193 | 0.93 | KMT2A (0.37) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564748 | 0.88 | KMT2A (0.37) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564870 | 0.88 | MTNR1A (0.38) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6563576 | 0.86 | MTNR1A (0.42) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6562919 | 0.86 | CA2 (0.37) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564556 | 0.85 | CA2 (0.36) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6566410 | 0.85 | MMP2 (0.35) | MMP2MMP9MMP14MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6566199 | 0.83 | ELANE (0.36) | MMP2MMP9MMP14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |