Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | KLK7 | P49862 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP14 | P50281 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.33 |
| ▸ | CACNA1B | Q00975 | 2/20 | 0.32 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | FAAH | O00519 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6564868 | 0.95 | MMP2 (0.37) | KMT2ALMNAHPGDKLK7SMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564791 | 0.93 | MTNR1A (0.37) | KMT2ALMNAHPGDKLK7SMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564556 | 0.92 | CA2 (0.36) | KMT2ALMNAHPGDKLK7SMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6563577 | 0.88 | MMP2 (0.37) | LMNAKLK7KDM4EMAPTMMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564802 | 0.87 | MTNR1A (0.36) | MMP2MMP9MMP14KCNH2MTNR1A | |
| Trifluoromethanesulfonic Acid SCHEMBL6566103 | 0.85 | CA2 (0.37) | ELANEMTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564792 | 0.84 | ELANE (0.44) | KMT2ALMNAHPGDKLK7SMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564628 | 0.84 | MMP2 (0.35) | LMNAKDM4EMAPTMMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566193 | 0.84 | KMT2A (0.37) | KMT2AHPGDKDM4EMMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562385 | 0.84 | MTNR1A (0.36) | KMT2AHPGDKDM4EMAPTKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |