Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6562919

CC(C)(C)OC(=O)Oc1ccc2cccc([S+]3CCCC3)c2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.37
ELANE P08246 1/20 0.35
MTNR1A P48039 8/20 0.33
MTNR1B P49286 5/20 0.33
NQO2 P16083 1/20 0.31
HTR2C P28335 1/20 0.31
HTR2B P41595 1/20 0.31
KDM1A O60341 1/20 0.31
ACACB O00763 1/20 0.31
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6566103 0.92 CA2 (0.37) CA2ELANEMTNR1AMTNR1BKDM1A
Trifluoromethanesulfonic Acid SCHEMBL6564870 0.90 MTNR1A (0.38) MTNR1AMTNR1BNQO2HTR2CHTR2B
Trifluoromethanesulfonic Acid SCHEMBL6566193 0.87 KMT2A (0.37) CA2MTNR1AMTNR1BHTR2CHTR2B
Trifluoromethanesulfonic Acid SCHEMBL6566410 0.87 MMP2 (0.35) MTNR1AMTNR1BNQO2HTR2CHTR2B
Trifluoromethanesulfonic Acid SCHEMBL6563577 0.86 MMP2 (0.37) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6564791 0.85 MTNR1A (0.37) ELANEMTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6566068 0.83 MTNR1A (0.42) MTNR1AMTNR1BHTR2CHTR2BTRPV1
Trifluoromethanesulfonic Acid SCHEMBL6564802 0.82 MTNR1A (0.36) MTNR1AMTNR1BNQO2TRPV1
Trifluoromethanesulfonic Acid SCHEMBL6564876 0.82 GAA (0.32) ELANE
Trifluoromethanesulfonic Acid SCHEMBL6562415 0.81 MTNR1A (0.35) MTNR1AMTNR1BTRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed