Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566068

COc1ccc2cccc([S+]3CCCC3)c2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.42

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Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 14/20 0.42
MTNR1B P49286 8/20 0.42
HTR2A P28223 1/20 0.38
TRPV1 Q8NER1 1/20 0.38
KCNH2 Q12809 2/20 0.38
HTR2C P28335 1/20 0.37
HTR2B P41595 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6564719 0.91 MTNR1A (0.39) MTNR1AMTNR1BKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6562415 0.90 MTNR1A (0.35) MTNR1AMTNR1BTRPV1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564570 0.88 MTNR1A (0.38) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6566367 0.88 MTNR1A (0.41) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6564870 0.87 MTNR1A (0.38) MTNR1AMTNR1BTRPV1HTR2CHTR2B
Trifluoromethanesulfonic Acid SCHEMBL6563576 0.86 MTNR1A (0.42) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6566222 0.84 MTNR1A (0.35) MTNR1AMTNR1BKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6562919 0.83 CA2 (0.37) MTNR1AMTNR1BTRPV1HTR2CHTR2B
Trifluoromethanesulfonic Acid SCHEMBL7796611 0.83 ALOX5 (0.43) MTNR1A
Trifluoromethanesulfonic Acid SCHEMBL6566193 0.82 KMT2A (0.37) MTNR1AMTNR1BTRPV1HTR2CHTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed