Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6562415

COCOc1ccc2cccc([S+]3CCCC3)c2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 15/20 0.35
MTNR1B P49286 11/20 0.35
ACHE P22303 1/20 0.33
TRPV1 Q8NER1 1/20 0.32
HTR1A P08908 1/20 0.32
HTR1D P28221 1/20 0.32
HTR1B P28222 1/20 0.32
KCNH2 Q12809 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6566222 0.92 MTNR1A (0.35) MTNR1AMTNR1BHTR1AHTR1DHTR1B
Trifluoromethanesulfonic Acid SCHEMBL6564570 0.92 MTNR1A (0.38) MTNR1AMTNR1BACHEHTR1AHTR1D
Trifluoromethanesulfonic Acid SCHEMBL6566405 0.91 ACHE (0.33) MTNR1AMTNR1BACHEKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6566367 0.91 MTNR1A (0.41) MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL6566068 0.90 MTNR1A (0.42) MTNR1AMTNR1BTRPV1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6563576 0.89 MTNR1A (0.42) MTNR1AMTNR1BHTR1AHTR1DHTR1B
Trifluoromethanesulfonic Acid SCHEMBL7796611 0.86 ALOX5 (0.43) MTNR1A
Trifluoromethanesulfonic Acid SCHEMBL6564870 0.84 MTNR1A (0.38) MTNR1AMTNR1BTRPV1
Trifluoromethanesulfonic Acid SCHEMBL6565959 0.83 GAA (0.34) KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6566112 0.83 ACHE (0.35) MTNR1AMTNR1BACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed