SCHEMBL658620

SCHEMBL658620

Cc1ccc(S(=O)(=O)O)cc1C1CCCCC1C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.40
JAK2 O60674 1/20 0.36
JAK1 P23458 1/20 0.36
TYK2 P29597 1/20 0.36
JAK3 P52333 1/20 0.36
THRB P10828 1/20 0.36
TDP1 Q9NUW8 2/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA7 P43166 2/20 0.36
CA14 Q9ULX7 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
PKM P14618 1/20 0.36
LMNA P02545 4/20 0.35
MAPT P10636 3/20 0.35
HTT P42858 3/20 0.35
NPSR1 Q6W5P4 2/20 0.35
GAA P10253 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8076428 0.97 ALDH1A1 (0.37) ALDH1A1JAK2JAK1TYK2JAK3
SCHEMBL780174 0.88 ALDH1A1 (0.38) ALDH1A1THRBTDP1CA12CA1
SCHEMBL7100553 0.87 ALDH1A1 (0.39) ALDH1A1THRBTDP1CA12CA1
SCHEMBL9101015 0.83 TDP1 (0.39) ALDH1A1THRBTDP1MEN1KMT2A
SCHEMBL8763566 0.83 ALDH1A1 (0.43) ALDH1A1THRBTDP1CA12CA1
SCHEMBL656155 0.81 PTGS2 (0.42) ALDH1A1THRBTDP1CA12CA1
SCHEMBL29104732 0.79 CA1 (0.41) ALDH1A1TDP1CA12CA1CA2
SCHEMBL778058 0.76 CA1 (0.36) ALDH1A1CA12CA1CA2CA7
SCHEMBL658618 0.75 NOS3 (0.38) JAK2JAK1TYK2JAK3CA1
SCHEMBL8089603 0.75 MEN1 (0.38) ALDH1A1TDP1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9982157-B2 Aqueous laser-sensitive composition for marking substrates DATALASE LTD. (GB) 2018-05-29 US disclosed
EP-2349734-B1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD (GB) 2018-03-28 EP disclosed
US-9333786-B2 Laser-sensitive coating formulations DATALASE, LTD. (GB) 2016-05-10 US disclosed
US-9267042-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2016-02-23 US disclosed
US-20150361289-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD. (GB) 2015-12-17 US disclosed
US-20120045624-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2012-02-23 US disclosed
US-20110274893-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2011-11-10 US disclosed
US-8021820-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2011-09-20 US disclosed
EP-2349734-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-08-03 EP disclosed
EP-2342295-A1 COATING COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-07-13 EP disclosed
US-20100233447-A1 LASER-SENSITIVE COATING FORMULATIONS CIBA CORPORATION (US) 2010-09-16 US disclosed
WO-2010049281-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
WO-2010049282-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
EP-2167323-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (DE) 2010-03-31 EP disclosed
US-20090191420-A1 Coating Composition for Marking Substrates CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2009-07-30 US disclosed
WO-2009010405-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (CH) 2009-01-22 WO disclosed
EP-1981717-A1 COATING COMPOSITION FOR MARKING SUBSTRATES Ciba Holding Inc. (CH) 2008-10-22 EP disclosed
WO-2007088104-A1 COATING COMPOSITION FOR MARKING SUBSTRATES CIBA HOLDING INC. (CH) 2007-08-09 WO disclosed
US-5489501-A MIXTURES OF TWO COORDINATION COMPOUNDS WHICH REACT TO FORM NEW COORDINATION COMPOUND WHILE CAUSING VISIBLE COLOR CHANGES RICOH COMPANY, LTD. (JP) 1996-02-06 US disclosed
US-5446011-A Imagewise coloring when heating; mixture of n-substituted indole, aromatic polyhydroxy compound, carbonyl compound and an acid RICOH COMPANY, LTD. (JP) 1995-08-29 US disclosed