Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.34 |
| ▸ | ACHE | P22303 | 9/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.33 |
| ▸ | KIF11 | P52732 | 1/20 | 0.33 |
| ▸ | BCHE | P06276 | 1/20 | 0.32 |
| ▸ | ACACB | O00763 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | PTPRZ1 | P23471 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL64048 | 0.94 | GPR3 (0.37) | GPR3KCNH2ACHEFFAR4KIF11 | |
| Trifluoromethanesulfonic Acid SCHEMBL8862157 | 0.94 | BCHE (0.40) | GPR3KCNH2ACHEFFAR4BCHE | |
| Trifluoromethanesulfonic Acid SCHEMBL63998 | 0.94 | GPR3 (0.37) | GPR3KCNH2ACHEFFAR4KIF11 | |
| Trifluoromethanesulfonic Acid SCHEMBL8436100 | 0.90 | KCNH2 (0.32) | GPR3KCNH2ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL8069550 | 0.90 | HSP90AA1 (0.34) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL8078870 | 0.90 | HSP90AA1 (0.34) | — | |
| SCHEMBL8321313 | 0.88 | PPARA (0.34) | KIF11ACACBPTGS2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3957928 | 0.87 | ACACB (0.35) | FFAR4KIF11ACACBHSD11B1PTPN1 | |
| SCHEMBL8649185 | 0.84 | FFAR4 (0.33) | ACHEFFAR4KIF11BCHEACACB | |
| Trifluoromethanesulfonic Acid SCHEMBL454992 | 0.83 | PKM (0.47) | KCNH2ACHEHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1248 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-02 | — | — | US | disclosed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | disclosed |
| US-5942367-A | HIGH SENSITIVITY, RESOLUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5876900-A | POLYHYDROXYSTYRENE POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-02 | — | — | US | disclosed |
| EP-0887705-A1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5705702-A | REACTING AN ARYL GRIGNARD REAGENT WITH THIONYL CHLORIDE, THEN WITH TRIORGANOSILYL SULFONATE OR TRIORGANOSILYLHALIDE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-01-06 | — | — | US | disclosed |
| US-5679496-A | CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DCLRE1A, CD79B, RAD1 | GPR3 2127/4885KCNH2 3155/4885ACHE 4837/4885 |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | ETV6, KCNQ4, KCNQ1 | GPR3 3728/4885KCNH2 417/4885ACHE 4214/4885 |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | GPR3 3108/4885KCNH2 543/4885ACHE 1292/4885 |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | GPR3 237/4885KCNH2 2940/4885ACHE 4845/4885 |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | RPS21, CA11, RPL21 | GPR3 4005/4885KCNH2 2679/4885ACHE 4822/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | GPR3 3805/4885KCNH2 3411/4885ACHE 4755/4885 |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | GPR3 2099/4885KCNH2 782/4885ACHE 3912/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.