SCHEMBL1664173

SCHEMBL1664173

CCCCCCCCCCCCCCCCS(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
PABPC1 P11940 1/20 0.39
EIF4H Q15056 1/20 0.39
CTDSP1 Q9GZU7 1/20 0.39
EPHX2 P34913 1/20 0.38
MMP1 P03956 1/20 0.38
MMP9 P14780 1/20 0.38
MMP13 P45452 1/20 0.38
NR1I2 O75469 1/20 0.38
PTGS2 P35354 1/20 0.38
FAAH O00519 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL453413 1.00 CES2 (0.39) CES2CES1PABPC1EIF4HCTDSP1
SCHEMBL217581 0.93 PABPC1 (0.41) CES2CES1PABPC1EIF4HCTDSP1
SCHEMBL3193355 0.93 MCHR1 (0.40) CES2CES1PABPC1EIF4HCTDSP1
SCHEMBL3203451 0.91 PABPC1 (0.37) PABPC1EIF4HCTDSP1MMP1MMP9
SCHEMBL1804914 0.91 ESR1 (0.43) PTGS2
SCHEMBL450157 0.89 MMP1 (0.38) MMP1MMP9MMP13
SCHEMBL2898670 0.89 MMP13 (0.42) PABPC1EIF4HCTDSP1EPHX2MMP1
SCHEMBL3199957 0.89 NR1I2 (0.40) NR1I2
SCHEMBL3190137 0.89 PTGS2 (0.41) PABPC1EIF4HCTDSP1MMP1MMP9
SCHEMBL6652819 0.86 CA12 (0.38) CES2CES1PABPC1EIF4HCTDSP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1688791-B1 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition FUJIFILM CORP (JP) 2013-08-14 EP disclosed
US-7923199-B2 Using a sulfonium acid generator that forms a fluorine-substituted sulfonic acid compound; improved in the exposure latitude, pitch dependency and line edge roughness and enhanced in the sensitivity and resolution at the exposure with EUV light FUJIFILM CORPORATION (JP) 2011-04-12 US disclosed
US-7691558-B2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
EP-1688791-A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition Fuji Photo Film Co., Ltd. (JP) 2006-08-09 EP disclosed
US-20060172228-A1 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition FUJI PHOTO FILM CO., LTD. 2006-08-03 US disclosed
US-20060166135-A1 Novel Acid generator having a carbamoyl structure that generates a sulfonic acid; sensitivity and resolution and improved in the exposure latitude, pattern profile and pitch dependency; use in semiconductor production FUJI PHOTO FILM CO., LTD. 2006-07-27 US disclosed
EP-1684116-A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2006-07-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060172228-A1 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition CA6, PPOX, PPIP5K2 CES2 3780/4885CES1 4030/4885PABPC1 2482/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.