Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.39 |
| ▸ | EIF4H | Q15056 | 1/20 | 0.39 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP13 | P45452 | 1/20 | 0.38 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1664173 | 1.00 | CES2 (0.39) | CES2CES1PABPC1EIF4HCTDSP1 | |
| SCHEMBL217581 | 0.93 | PABPC1 (0.41) | CES2CES1PABPC1EIF4HCTDSP1 | |
| SCHEMBL3193355 | 0.93 | MCHR1 (0.40) | CES2CES1PABPC1EIF4HCTDSP1 | |
| SCHEMBL3203451 | 0.91 | PABPC1 (0.37) | PABPC1EIF4HCTDSP1MMP1MMP9 | |
| SCHEMBL1804914 | 0.91 | ESR1 (0.43) | PTGS2 | |
| SCHEMBL450157 | 0.89 | MMP1 (0.38) | MMP1MMP9MMP13 | |
| SCHEMBL2898670 | 0.89 | MMP13 (0.42) | PABPC1EIF4HCTDSP1EPHX2MMP1 | |
| SCHEMBL3199957 | 0.89 | NR1I2 (0.40) | NR1I2 | |
| SCHEMBL3190137 | 0.89 | PTGS2 (0.41) | PABPC1EIF4HCTDSP1MMP1MMP9 | |
| SCHEMBL6652819 | 0.86 | CA12 (0.38) | CES2CES1PABPC1EIF4HCTDSP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 307 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250383599-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION | YCCHEM CO LTD (KR) | 2025-12-18 | — | — | US | claimed |
| EP-4607277-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199406-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| EP-4369099-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION | Ycchem Co., Ltd. (KR) | 2024-05-15 | — | — | EP | claimed |
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | claimed |
| CN-109154776-A | Chemical amplifying type negative photoresist composition | 荣昌化学制品株式会社 | 2019-01-04 | — | — | CN | claimed |
| CN-109073973-A | KrF laser negative photoresist composition with high-resolution and high aspect ratio | 荣昌化学制品株式会社 | 2018-12-21 | — | — | CN | claimed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-107850841-A | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2018-03-27 | — | — | CN | claimed |
| CN-105566552-A | Acrylate copolymer and 248nm photoresist composition made thereof | UNIV JIANGNAN | 2016-05-11 | — | — | CN | claimed |
| CN-102037409-B | Orthogonal processing of organic materials used in electronic and electrical devices | UNIV CORNELL | 2013-12-11 | — | — | CN | claimed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | claimed |
| CN-102037409-A | Orthogonal processing of organic materials used in electronic and electrical devices | UNIV CORNELL | 2011-04-27 | — | — | CN | claimed |
| CN-100561344-C | Have improve etch resistant properties fluoridize the photoresist material | IBM (US) | 2009-11-18 | — | — | CN | claimed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | claimed |
| EP-1669421-B1 | Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-07-18 | — | — | EP | claimed |
| CN-1846169-A | Negative resist composition with fluorosulfonamide-containing polymer | IBM (US) | 2006-10-11 | — | — | CN | claimed |
| CN-1782876-A | Fluorinated photoresist materials with improved etch resistant properties | IBM (US) | 2006-06-07 | — | — | CN | claimed |
| CN-1637603-A | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | IBM (US) | 2005-07-13 | — | — | CN | claimed |