SCHEMBL6693752

SCHEMBL6693752

C=C(C)c1ccc(OC(C)(OC(C)C)C(C)(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.35
MAPT P10636 2/20 0.35
MEN1 O00255 1/20 0.35
USP2 O75604 1/20 0.35
ABCB11 O95342 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
CYP2C9 P11712 1/20 0.35
ADRB3 P13945 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35
CNR1 P21554 1/20 0.35
ACHE P22303 1/20 0.35
SLC6A2 P23975 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
MAPK1 P28482 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6695701 0.83 KMT2A (0.36) KMT2AMAPTMEN1USP2ABCB11
SCHEMBL6697868 0.81 MAPT (0.37) MAPTLMNAHPGDPPARGPPARA
SCHEMBL6695288 0.81 MAPT (0.35) KMT2AMAPTMEN1USP2ABCB11
SCHEMBL6689009 0.80 MAPT (0.33) MAPTPPARGPPARA
SCHEMBL6691069 0.78 ADORA3 (0.33) KMT2AMAPTMEN1USP2ABCB11
SCHEMBL6694535 0.77 ABCB11 (0.33) MAPTABCB11CYP1A2CYP3A4TSHR
SCHEMBL6693598 0.76 ELANE (0.35) KMT2AMAPTMEN1USP2ABCB11
SCHEMBL6691329 0.75 ALDH1A1 (0.37)
SCHEMBL6689024 0.75 L3MBTL1 (0.33) KMT2AMAPTADRB3PPARG
SCHEMBL1711303 0.75 MAPT (0.38) KMT2AMAPTMEN1USP2ABCB11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed