SCHEMBL6695288

SCHEMBL6695288

C=C(C)c1ccc(OC(C)(OC(C)C)C(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 1/20 0.35
USP2 O75604 1/20 0.35
ABCB11 O95342 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
CYP2C9 P11712 1/20 0.35
ADRB3 P13945 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35
CNR1 P21554 1/20 0.35
ACHE P22303 1/20 0.35
SLC6A2 P23975 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
MAPK1 P28482 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6697194 0.85 MAPT (0.35) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6694114 0.84 ELANE (0.33) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6695701 0.83 KMT2A (0.36) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6694144 0.81 ABCB11 (0.31) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6693752 0.81 KMT2A (0.35) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6694517 0.79 TAS1R3 (0.32) ADRB3
SCHEMBL6691069 0.78 ADORA3 (0.33) MAPTKMT2ALMNAMEN1USP2
SCHEMBL6699148 0.78 SLC2A1 (0.34) TSHR
SCHEMBL6694137 0.77 SMN1; SMN2 (0.32) MAPTLMNAHPGDSMN1; SMN2NPSR1
SCHEMBL6693598 0.76 ELANE (0.35) MAPTKMT2ALMNAMEN1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed