SCHEMBL6720995

SCHEMBL6720995

CC(C)(SC(=S)c1ccccc1)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.39
GAA P10253 3/20 0.39
MAPT P10636 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
HTT P42858 2/20 0.39
KDM4E B2RXH2 1/20 0.39
AGTR1 P30556 1/20 0.39
KIF11 P52732 1/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
CTDSP1 Q9GZU7 1/20 0.38
CYP2C9 P11712 1/20 0.38
PTPN5 P54829 1/20 0.36
EPHX1 P07099 1/20 0.36
ALDH1A1 P00352 3/20 0.36
LMNA P02545 2/20 0.36
ALOX12 P18054 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
RXFP1 Q9HBX9 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1524290 0.93 EPHX1 (0.40) SMN1; SMN2GAAMAPTMEN1KMT2A
SCHEMBL164092 0.89 ALDH1A1 (0.38) GAAMAPTMEN1KMT2AKDM4E
SCHEMBL163804 0.85 KMT2A (0.41) SMN1; SMN2MAPTMEN1KMT2AHTT
SCHEMBL19355148 0.81 RXRA (0.36) MAPTKIF11EPHX1ALDH1A1RXRA
SCHEMBL6721066 0.80 SMN1; SMN2 (0.44) SMN1; SMN2GAAMAPTMEN1KMT2A
SCHEMBL6721030 0.80 ALDH1A1 (0.45) MAPTMEN1KMT2ANPC1RAB9A
SCHEMBL165630 0.78 CES2 (0.39) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL236901 0.75 ALDH1A1 (0.41) SMN1; SMN2GAAMAPTMEN1KMT2A
SCHEMBL28727140 0.73 KIF11 (0.50) SMN1; SMN2MAPTKIF11CYP2C9PTPN5
SCHEMBL5841101 0.72 ALDH1A1 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
EP-1975712-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed