SCHEMBL6721059

SCHEMBL6721059

CC(C)(C)SC(=S)c1ccc2ccccc2c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.46
CES1 P23141 1/20 0.46
F2 P00734 1/20 0.43
PLG P00747 1/20 0.43
PLAU P00749 1/20 0.43
KLKB1 P03952 1/20 0.43
KLK1 P06870 1/20 0.43
PRSS1 P07477 1/20 0.43
IDO1 P14902 1/20 0.41
SMN1; SMN2 Q16637 4/20 0.40
HPGD P15428 3/20 0.40
KDM4E B2RXH2 3/20 0.40
ALDH1A1 P00352 5/20 0.40
MAPT P10636 3/20 0.40
ALOX12 P18054 3/20 0.40
TDP1 Q9NUW8 2/20 0.40
MEN1 O00255 1/20 0.40
EGFR P00533 1/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6720998 0.83 CES2 (0.41) CES2CES1F2PLGPLAU
SCHEMBL14108351 0.79 IDO1 (0.51) CES2CES1F2PLGPLAU
SCHEMBL13377779 0.79 CES2 (0.54) CES2CES1F2PLGPLAU
SCHEMBL236901 0.77 ALDH1A1 (0.41) CES2CES1SMN1; SMN2HPGDKDM4E
SCHEMBL6721066 0.74 SMN1; SMN2 (0.44) SMN1; SMN2HPGDKDM4EALDH1A1MAPT
SCHEMBL6721100 0.74 PARP10 (0.44) SMN1; SMN2HPGDALDH1A1MAPTALOX12
SCHEMBL6721098 0.71 ALDH1A1 (0.50) HPGDALDH1A1MAPTTDP1MEN1
SCHEMBL23743522 0.70 CES2 (0.45) CES2CES1PRSS1SMN1; SMN2HPGD
SCHEMBL1479594 0.70 CES2 (0.58) CES2CES1F2PLGPLAU
SCHEMBL6721095 0.69 MAPT (0.53) PRSS1SMN1; SMN2ALDH1A1MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed