SCHEMBL6721078

SCHEMBL6721078

CC(C)(C)OB(c1ccc(-c2ccccc2)cc1)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 2/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
ORAI1 Q96D31 1/20 0.39
ORAI2 Q96SN7 1/20 0.39
ORAI3 Q9BRQ5 1/20 0.39
TRPV6 Q9H1D0 1/20 0.39
ALDH1A1 P00352 2/20 0.38
KIF11 P52732 1/20 0.35
CYP1A2 P05177 3/20 0.34
TAAR1 Q96RJ0 2/20 0.34
MAPK1 P28482 2/20 0.34
CYP3A4 P08684 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
MMP3 P08254 1/20 0.34
BCL2L1 Q07817 1/20 0.34
HTR6 P50406 1/20 0.34
MAPT P10636 2/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16300534 0.76 MGLL (0.50) MGLLCA1CA2ORAI1ORAI2
SCHEMBL10057608 0.69 MGLL (0.44) MGLLCA1CA2ORAI1ORAI2
Biphenyl SCHEMBL1193167 0.69 ALDH1A1 (0.53) ALDH1A1KIF11CYP1A2TAAR1MAPK1
Biphenyl SCHEMBL28173511 0.69 ALDH1A1 (0.53) ALDH1A1KIF11CYP1A2TAAR1MAPK1
SCHEMBL26451 0.69 TRPV6 (0.40) ORAI1ORAI2ORAI3TRPV6ALDH1A1
SCHEMBL10806930 0.69 KIF11 (0.52) MGLLCA1CA2ALDH1A1KIF11
Bromide SCHEMBL27480019 0.68 ORAI1 (0.52) ORAI1ORAI2ORAI3TRPV6ALDH1A1
Biphenyl SCHEMBL27745920 0.68 ALDH1A1 (0.69) ALDH1A1KIF11CYP1A2TAAR1MAPK1
Biphenyl SCHEMBL2304558 0.67 ALDH1A1 (0.50) ALDH1A1KIF11CYP1A2TAAR1MAPK1
Biphenyl SCHEMBL21467263 0.67 ALDH1A1 (0.50) CA1CA2ALDH1A1KIF11CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed