SCHEMBL6733323

SCHEMBL6733323

C=CC(=O)Oc1ccc(C(c2ccc(O)cc2)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 1/20 0.56
▸ ESR2 Q92731 1/20 0.56
▸ THRB P10828 2/20 0.43
▸ ELANE P08246 2/20 0.37
▸ KIF11 P52732 2/20 0.37
▸ ALDH5A1 P51649 1/20 0.37
▸ ABAT P80404 1/20 0.37
▸ TGM2 P21980 1/20 0.34
▸ P4HB P07237 1/20 0.34
▸ CYP1A1 P04798 1/20 0.34
▸ CYP1B1 Q16678 1/20 0.34
▸ TEAD1 P28347 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10858115 0.94 THRB (0.47) ESR1ESR2THRBELANEKIF11
SCHEMBL140760 0.83 THRB (0.56) ESR1ESR2THRBELANEALDH5A1
SCHEMBL8617589 0.82 ESR1 (0.62) ESR1ESR2ELANEKIF11P4HB
Acrylic Acid SCHEMBL29799609 0.82 ESR1 (0.67) ESR1ESR2KIF11ALDH5A1ABAT
SCHEMBL644250 0.81 ESR1 (0.53) ESR1ESR2THRBELANEALDH5A1
SCHEMBL7214471 0.80 THRB (0.74) THRB
SCHEMBL12085342 0.80 KIF11 (0.56) THRBKIF11TGM2CYP1A1CYP1B1
SCHEMBL6739360 0.79 ESR1 (0.53) ESR1ESR2ELANEKIF11
SCHEMBL22336441 0.79 NR1H2 (0.47) THRBKIF11
SCHEMBL18116337 0.78 THRB (0.45) THRBCYP1A1CYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6686123-B2 ADHESIVENESS TO A WAFER, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION, SUITABLE FOR PHOTOLITHOGRAPHY HYNIX SEMICONDUCTOR INC (KR) 2004-02-03 — — US disclosed
US-6627383-B2 4-(2-(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropyl)phenyl methacrylate and styrene copolymers HYNIX SEMICONDUCTOR INC (KR) 2003-09-30 — — US disclosed
US-20020061466-A1 Photoresist monomer, polymer thereof and photoresist composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2002-05-23 — — US disclosed
US-20020051940-A1 Photoresist monomer comprising bisphenol derivatives and polymers thereof HYNIX SEMICONDUCTOR INC. (KR) 2002-05-02 — — US disclosed
Send feedback