SCHEMBL6806182

SCHEMBL6806182

C=C(C)C(=O)OC(C(=O)C(=C)C)(C(=O)C(=C)C)C(CO)(CO)COC(=O)c1ccc([N+](=O)[O-])cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 2/20 0.42
ADRB1 P08588 2/20 0.42
ADRB3 P13945 2/20 0.42
ATM Q13315 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
MEN1 O00255 6/20 0.40
KMT2A Q03164 6/20 0.40
ALDH1A1 P00352 5/20 0.40
MAPT P10636 4/20 0.40
KDM4E B2RXH2 1/20 0.40
ALOX5 P09917 1/20 0.39
MAPK1 P28482 1/20 0.39
KCNJ1 P48048 1/20 0.38
KCNH2 Q12809 1/20 0.38
POLB P06746 1/20 0.38
LMNA P02545 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
THRB P10828 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Nitrobenzoic Acid SCHEMBL6806184 0.85 TDP1 (0.49) L3MBTL1MEN1KMT2AALDH1A1MAPK1
SCHEMBL6802558 0.84 LMNA (0.43) ADRB2ADRB1ADRB3ALDH1A1MAPT
SCHEMBL7728821 0.76 ADRB2 (0.41) ADRB2ADRB1ADRB3ALDH1A1KDM4E
SCHEMBL16338718 0.75 ATM (0.58) ADRB2ADRB1ADRB3ATML3MBTL1
SCHEMBL7721993 0.74 ALDH1A1 (0.47) L3MBTL1MEN1KMT2AALDH1A1KDM4E
SCHEMBL1312520 0.73 MAPK1 (0.58) ATML3MBTL1MEN1KMT2AALDH1A1
SCHEMBL7733535 0.72 NPC1 (0.32) POLB
SCHEMBL8537893 0.71 ADRB2 (0.59) ADRB2ADRB1ADRB3ATML3MBTL1
SCHEMBL18293614 0.71 ADRB2 (0.59) ADRB2ADRB1ADRB3ATML3MBTL1
SCHEMBL887514 0.71 ADRB2 (0.64) ADRB2ADRB1ADRB3ATML3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743851-B2 MIXTURE CONTAINING TETRAZOLE NIPPON ZEON CO., LTD. (JP) 2004-06-01 US disclosed
US-6734248-B2 CONTAINING A 1H-TETRAZOLE OR A 5,5'-BIS-1H-TETRAZOLE NIPPON ZEON CO., LTD. (JP) 2004-05-11 US disclosed
EP-0822229-B1 POLYIMIDE RESIN COMPOSITION NIPPON ZEON CO (JP) 2003-07-30 EP disclosed
US-20020035196-A1 Polyimide film TANAKA AKIRA (JP) 2002-03-21 US disclosed
US-20020032273-A1 Pattern forming process using polyimide resin composition TANAKA AKIRA (JP) 2002-03-14 US disclosed
US-6310135-B1 PHOTOSENSITIVE RESINS WITH TETRAZOLE COMPOUND NIPPON ZEON CO., LTD. (JP) 2001-10-30 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0822229-A1 POLYIMIDE RESIN COMPOSITION NIPPON ZEON CO., LTD. (JP) 1998-02-04 EP disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed