Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Aminobenzoic Acid SCHEMBL7721636 | 0.91 | POLB (0.35) | POLBAPEX1HTTTDP1 | |
| 3-Aminobenzoic Acid SCHEMBL7728360 | 0.89 | — | — | |
| Anthranilic Acid SCHEMBL8018584 | 0.86 | — | — | |
| Aminobenzoic Acid SCHEMBL6802563 | 0.80 | HTT (0.40) | POLBAPEX1HTTTDP1 | |
| 3-Aminobenzoic Acid SCHEMBL7728353 | 0.80 | PBRM1 (0.32) | POLBAPEX1HTTTDP1 | |
| Anthranilic Acid SCHEMBL8018582 | 0.76 | HSD17B10 (0.32) | TDP1 | |
| Aminobenzoic Acid SCHEMBL7730847 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL6802558 | 0.71 | LMNA (0.43) | POLBAPEX1HTTTDP1 | |
| Terephthalic Acid SCHEMBL11490237 | 0.68 | TSHR (0.50) | — | |
| 3-Aminobenzoic Acid SCHEMBL7728826 | 0.68 | PBRM1 (0.38) | POLBAPEX1HTTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |