SCHEMBL682068

SCHEMBL682068

CCCCCc1ccccc1OCCOC(C)OC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.44
PTGS2 P35354 1/20 0.44
THRA P10827 1/20 0.42
THRB P10828 1/20 0.42
MAPT P10636 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
LTB4R Q15722 1/20 0.42
LTB4R2 Q9NPC1 1/20 0.42
PPARD Q03181 1/20 0.41
ADRB2 P07550 4/20 0.41
ADRB1 P08588 4/20 0.41
HPGD P15428 1/20 0.40
ATM Q13315 1/20 0.40
CSNK1A1 P48729 1/20 0.40
CSNK1D P48730 1/20 0.40
PRKCD Q05655 1/20 0.40
PAK1 Q13153 1/20 0.40
CAMK2B Q13554 1/20 0.40
CAMK2G Q13555 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683428 0.99 THRA (0.44) ALOX5PTGS2THRATHRBMAPT
SCHEMBL14443350 0.87 MAPT (0.45) ALOX5PTGS2THRATHRBMAPT
SCHEMBL683138 0.87 CYP1A2 (0.45) MAPTL3MBTL1NPSR1PPARACYP1A2
SCHEMBL14443346 0.86 THRA (0.47) ALOX5PTGS2THRATHRBMAPT
SCHEMBL682086 0.85 MEN1 (0.47) MAPTL3MBTL1PPARACYP1A2CYP2C9
SCHEMBL8523169 0.82 LTB4R (0.55) ALOX5PTGS2THRATHRBMAPT
SCHEMBL11344012 0.80 THRA (0.55) ALOX5PTGS2THRATHRBMAPT
SCHEMBL6669407 0.80 THRA (0.55) ALOX5PTGS2THRATHRBMAPT
SCHEMBL6550074 0.80 LTB4R (0.57) ALOX5PTGS2THRATHRBMAPT
SCHEMBL6547809 0.80 LTB4R (0.57) ALOX5PTGS2THRATHRBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed