SCHEMBL682086

SCHEMBL682086

CCCCCCOc1ccccc1OCCOC(C)OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.47
NR1I2 O75469 1/20 0.47
LMNA P02545 1/20 0.47
CHRM2 P08172 1/20 0.47
CYP3A4 P08684 1/20 0.47
ADRA2A P08913 1/20 0.47
MAPT P10636 1/20 0.47
OPRK1 P41145 1/20 0.47
HTR2B P41595 1/20 0.47
SLC6A3 Q01959 1/20 0.47
KMT2A Q03164 1/20 0.47
HDAC6 Q9UBN7 1/20 0.47
ALDH1A1 P00352 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
PPARG P37231 3/20 0.43
L3MBTL1 Q9Y468 3/20 0.41
TDP1 Q9NUW8 1/20 0.41
CYSLTR2 Q9NS75 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683138 0.98 CYP1A2 (0.45) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL683428 0.87 THRA (0.44) MAPTL3MBTL1PPARA
SCHEMBL682068 0.85 ALOX5 (0.44) MAPTCYP1A2CYP2C9CYP2C19L3MBTL1
SCHEMBL14443360 0.85 MAPT (0.50) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL682083 0.84 NR5A1 (0.54) LMNAMAPTTP53PLA2G4B
SCHEMBL14443368 0.83 CYP1A2 (0.49) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL682076 0.82 NR5A1 (0.51) LMNAMAPTTP53PLA2G4B
SCHEMBL2859001 0.81 LMNA (0.62) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL9387360 0.81 LMNA (0.62) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL1964196 0.81 LMNA (0.62) MEN1NR1I2LMNACHRM2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed