SCHEMBL683428

SCHEMBL683428

CCCCCCc1ccccc1OCCOC(C)OC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.44
THRB P10828 1/20 0.44
LTB4R Q15722 1/20 0.44
LTB4R2 Q9NPC1 1/20 0.44
ALOX5 P09917 1/20 0.43
PTGS2 P35354 1/20 0.43
ADRB2 P07550 4/20 0.43
ADRB1 P08588 4/20 0.43
PPARA Q07869 1/20 0.42
MAPT P10636 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
LIPG Q9Y5X9 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
PPARD Q03181 1/20 0.41
HPGD P15428 1/20 0.40
ATM Q13315 1/20 0.40
CSNK1A1 P48729 1/20 0.39
CSNK1D P48730 1/20 0.39
PRKCD Q05655 1/20 0.39
PAK1 Q13153 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682068 0.99 ALOX5 (0.44) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL14443346 0.87 THRA (0.47) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL682086 0.87 MEN1 (0.47) PPARAMAPTL3MBTL1
SCHEMBL14443350 0.86 MAPT (0.45) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL683138 0.86 CYP1A2 (0.45) PPARAMAPTL3MBTL1NPSR1
SCHEMBL11344012 0.82 THRA (0.55) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL6669407 0.82 THRA (0.55) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL6547809 0.82 LTB4R (0.57) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL9489161 0.82 LTB4R (0.57) THRATHRBLTB4RLTB4R2ALOX5
SCHEMBL6550074 0.82 LTB4R (0.57) THRATHRBLTB4RLTB4R2ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed