SCHEMBL683138

SCHEMBL683138

CCCCCOc1ccccc1OCCOC(C)OC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.45
CYP2C9 P11712 1/20 0.45
CYP2C19 P33261 1/20 0.45
MAPT P10636 2/20 0.44
MEN1 O00255 1/20 0.44
NR1I2 O75469 1/20 0.44
LMNA P02545 1/20 0.44
CHRM2 P08172 1/20 0.44
CYP3A4 P08684 1/20 0.44
ADRA2A P08913 1/20 0.44
OPRK1 P41145 1/20 0.44
HTR2B P41595 1/20 0.44
SLC6A3 Q01959 1/20 0.44
KMT2A Q03164 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
L3MBTL1 Q9Y468 4/20 0.42
TDP1 Q9NUW8 1/20 0.42
ALDH1A1 P00352 2/20 0.42
TP53 P04637 1/20 0.42
PPARG P37231 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682086 0.98 MEN1 (0.47) CYP1A2CYP2C9CYP2C19MAPTMEN1
SCHEMBL682068 0.87 ALOX5 (0.44) CYP1A2CYP2C9CYP2C19MAPTL3MBTL1
SCHEMBL683428 0.86 THRA (0.44) MAPTL3MBTL1PPARANPSR1
SCHEMBL14443368 0.85 CYP1A2 (0.49) CYP1A2CYP2C9CYP2C19MAPTMEN1
SCHEMBL14443360 0.83 MAPT (0.50) CYP1A2CYP2C9CYP2C19MAPTMEN1
SCHEMBL682076 0.83 NR5A1 (0.51) MAPTLMNATP53LTA4H
SCHEMBL682083 0.82 NR5A1 (0.54) MAPTLMNATP53LTA4H
SCHEMBL6651604 0.80 CYP1A2 (0.63) CYP1A2CYP2C9CYP2C19MAPTMEN1
SCHEMBL30096940 0.80 CYP1A2 (0.63) CYP1A2CYP2C9CYP2C19MAPTMEN1
SCHEMBL683156 0.79 NPSR1 (0.44) CYP1A2CYP2C9CYP2C19MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed