Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PON1 | P27169 | 3/20 | 0.66 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.59 |
| ▸ | NR2E3 | Q9Y5X4 | 1/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.58 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | RAB9A | P51151 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | PRKDC | P78527 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5969658 | 0.87 | KMT2A (0.59) | PON1DYRK1AKMT2AKDM4EHSD17B10 | |
| SCHEMBL13483549 | 0.81 | HSD17B3 (0.60) | DYRK1AKMT2ANR2E3KDM4EHSD17B10 | |
| SCHEMBL15245387 | 0.80 | MCL1 (0.66) | PON1DYRK1AKMT2AKDM4EMCL1 | |
| SCHEMBL24938765 | 0.80 | DYRK1A (1.00) | PON1DYRK1AKMT2AKDM4EHSD17B10 | |
| SCHEMBL15245384 | 0.80 | KMT2A (0.62) | PON1DYRK1AKMT2ANR2E3KDM4E | |
| SCHEMBL19354020 | 0.78 | KMT2A (0.54) | PON1DYRK1AKMT2ANR2E3KDM4E | |
| SCHEMBL5456535 | 0.77 | ALDH1A1 (0.51) | KMT2ANR2E3KDM4EHSD17B10TSHR | |
| SCHEMBL1209429 | 0.77 | PON1 (0.58) | PON1DYRK1AKMT2AKDM4EHSD17B10 | |
| SCHEMBL30636721 | 0.77 | ALDH1A1 (0.64) | KDM4EHSD17B10MCL1TSHRALDH1A1 | |
| SCHEMBL67818 | 0.77 | ALDH1A1 (0.64) | KDM4EHSD17B10MCL1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230158152-A1 | PROTEOLYSIS REGULATOR AND METHOD FOR USING SAME | MEDSHINE DISCOVERY INC. (CN) | 2023-05-25 | — | — | US | disclosed |
| US-8742132-B2 | Indolylmaleimide derivatives processes for their production and pharmaceutical compositions | NOVARTIS AG (CH) | 2014-06-03 | — | — | US | disclosed |
| US-8742132-B2 | Indolylmaleimide derivatives processes for their production and pharmaceutical compositions | NOVARTIS AG (CH) | 2014-06-03 | — | — | US | disclosed |
| US-8742132-B2 | Indolylmaleimide derivatives processes for their production and pharmaceutical compositions | NOVARTIS AG (CH) | 2014-06-03 | — | — | US | disclosed |
| EP-2094689-B1 | INDOLYLMALEIMIDE DERIVATIVES AS KINASE INHIBITORS | NOVARTIS AG (CH) | 2013-04-03 | — | — | EP | disclosed |
| EP-2094689-B1 | INDOLYLMALEIMIDE DERIVATIVES AS KINASE INHIBITORS | NOVARTIS AG (CH) | 2013-04-03 | — | — | EP | disclosed |
| US-20120219593-A1 | INDOLYLMALEIMIDE DERIVATIVES PROCESSES FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS | NOVARTIS AG | 2012-08-30 | — | — | US | disclosed |
| US-20120219593-A1 | INDOLYLMALEIMIDE DERIVATIVES PROCESSES FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS | NOVARTIS AG | 2012-08-30 | — | — | US | disclosed |
| US-20120219593-A1 | INDOLYLMALEIMIDE DERIVATIVES PROCESSES FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS | NOVARTIS AG | 2012-08-30 | — | — | US | disclosed |
| US-8193236-B2 | Indolylmaleimide derivatives processes for their production and pharmaceutical compositions | NOVARTIS AG (CH) | 2012-06-05 | — | — | US | disclosed |
| CN-101558062-A | Indolylmaleimide derivatives as kinase inhibitors | NOVARTIS AG (CH) | 2009-10-14 | — | — | CN | disclosed |
| US-20090233232-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | CANON KABUSHIKI KAISHA (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-2094689-A2 | INDOLYLMALEIMIDE DERIVATIVES AS KINASE INHIBITORS | Novartis AG (CH) | 2009-09-02 | — | — | EP | disclosed |
| CN-101256358-A | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | CANON KK (JP) | 2008-09-03 | — | — | CN | disclosed |
| EP-1956430-A1 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | Canon Kabushiki Kaisha (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-20080187864-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | CANON KABUSHIKI KAISHA (JP) | 2008-08-07 | — | — | US | disclosed |
| WO-2008074752-A2 | INDOLYLMALEIMIDE DERIVATIVES AS KINASE INHIBITORS | NOVARTIS AG (CH) | 2008-06-26 | — | — | WO | disclosed |
| WO-2008074752-A2 | INDOLYLMALEIMIDE DERIVATIVES AS KINASE INHIBITORS | NOVARTIS AG (CH) | 2008-06-26 | — | — | WO | disclosed |
| US-20030035917-A1 | Image making medium | HYMAN SYDNEY (US) | 2003-02-20 | — | — | US | disclosed |
| US-4634701-A | Furan derivatives having anti-ulcer activity | AUSONIA FARMACEUTICI S.R.L. (IT) | 1987-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230158152-A1 | PROTEOLYSIS REGULATOR AND METHOD FOR USING SAME | PSMA6, PSMC1, PSMA1 | PON1 593/4885DYRK1A 3072/4885KMT2A 1544/4885 |
| US-20090233232-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | FRG1, PAH, RER1 | PON1 3488/4885DYRK1A 4233/4885KMT2A 1323/4885 |
| US-20080187864-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | FRG1, PAH, RER1 | PON1 3488/4885DYRK1A 4233/4885KMT2A 1323/4885 |
| US-20120219593-A1 | INDOLYLMALEIMIDE DERIVATIVES PROCESSES FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS | RB1, INMT, IDH3A | PON1 3503/4885DYRK1A 1548/4885KMT2A 1726/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.