Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 2/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.34 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19333726 | 0.93 | SCN9A (0.31) | SCN9A | |
| SCHEMBL17736193 | 0.87 | MEN1 (0.37) | CHRNA7CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL18924642 | 0.82 | — | — | |
| SCHEMBL22048407 | 0.82 | CHRNA7 (0.32) | CHRNA7 | |
| SCHEMBL20333367 | 0.81 | MEN1 (0.36) | SCN9AMEN1KMT2AALDH1A1 | |
| SCHEMBL686108 | 0.81 | CNR2 (0.36) | SCN9AMEN1KMT2AALDH1A1 | |
| SCHEMBL19772578 | 0.80 | — | — | |
| SCHEMBL685653 | 0.80 | ALDH1A3 (0.33) | CHRNA7CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL10182512 | 0.79 | ALDH1A1 (0.37) | SCN9AMEN1KMT2AALDH1A1 | |
| SCHEMBL25858572 | 0.78 | MEN1 (0.34) | SCN9AMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10795258-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-15 | — | — | US | disclosed |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-28 | — | — | US | disclosed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-03-24 | — | — | US | disclosed |
| US-10571805-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-25 | — | — | US | disclosed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-10365560-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-30 | — | — | US | disclosed |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-23 | — | — | US | disclosed |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | SCN9A 4709/4885CHRNA7 2055/4885CHRNB2 3321/4885 |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | SCN9A 3385/4885CHRNA7 2321/4885CHRNB2 2711/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | SCN9A 4360/4885CHRNA7 2980/4885CHRNB2 3818/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | SCN9A 4374/4885CHRNA7 3065/4885CHRNB2 3632/4885 |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | CBR1, CBR3, C1R | SCN9A 865/4885CHRNA7 2405/4885CHRNB2 3352/4885 |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | RER1, FRG1, C1R | SCN9A 1124/4885CHRNA7 941/4885CHRNB2 1367/4885 |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | SCN9A 3454/4885CHRNA7 2315/4885CHRNB2 2657/4885 |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | SCN9A 3434/4885CHRNA7 2337/4885CHRNB2 2688/4885 |
| US-10377692-B2 | Photoresist composition | C1R, C1S, F12 | SCN9A 4676/4885CHRNA7 2157/4885CHRNB2 3292/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.