Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18826705 | 0.92 | — | — | |
| SCHEMBL18033954 | 0.85 | CHRNA7 (0.32) | ALDH1A3CHRNA7CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL18799654 | 0.81 | — | — | |
| SCHEMBL684988 | 0.80 | SCN9A (0.34) | ALDH1A3ALDH1A1CHRNA7CHRNB2CHRNB4 | |
| SCHEMBL685655 | 0.79 | CNR2 (0.38) | ALDH1A1CNR2 | |
| SCHEMBL13181273 | 0.78 | EPHX2 (0.38) | ALDH1A1CNR2 | |
| SCHEMBL17736193 | 0.78 | MEN1 (0.37) | ALDH1A1CHRNA7CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL13154061 | 0.77 | CNR2 (0.31) | CNR2 | |
| SCHEMBL12132106 | 0.76 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL12159379 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 331 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-15 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-28 | — | — | US | disclosed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-03-24 | — | — | US | disclosed |
| US-10571805-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-25 | — | — | US | disclosed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-10365560-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-30 | — | — | US | disclosed |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-23 | — | — | US | disclosed |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100056748-A1 | Novel star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | ALDH1A3 1258/4885ALDH1A1 2162/4885CHRNA7 2055/4885 |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | ALDH1A3 2260/4885ALDH1A1 759/4885CHRNA7 2321/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | ALDH1A3 820/4885ALDH1A1 1016/4885CHRNA7 2980/4885 |
| US-20100056748-A1 | Novel star polymer and coupling agent for anionic polymerization | MSN, PAM, STARD10 | ALDH1A3 3624/4885ALDH1A1 4034/4885CHRNA7 2938/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | ALDH1A3 771/4885ALDH1A1 706/4885CHRNA7 3065/4885 |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | CBR1, CBR3, C1R | ALDH1A3 1465/4885ALDH1A1 2184/4885CHRNA7 2405/4885 |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | RER1, FRG1, C1R | ALDH1A3 4028/4885ALDH1A1 2924/4885CHRNA7 941/4885 |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | ALDH1A3 2011/4885ALDH1A1 747/4885CHRNA7 2315/4885 |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | ALDH1A3 2117/4885ALDH1A1 776/4885CHRNA7 2337/4885 |
| US-10377692-B2 | Photoresist composition | C1R, C1S, F12 | ALDH1A3 1238/4885ALDH1A1 2217/4885CHRNA7 2157/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.