Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 2/20 | 0.52 |
| ▸ | GABRA1 | P14867 | 3/20 | 0.43 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.43 |
| ▸ | HSP90AA1 | P07900 | 3/20 | 0.40 |
| ▸ | HSP90AB1 | P08238 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.39 |
| ▸ | HTR2B | P41595 | 2/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | G6PD | P11413 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | THRA | P10827 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11414653 | 0.84 | LMNA (0.53) | TRPA1GABRA1GABRB2LMNASLC6A2 | |
| SCHEMBL5386132 | 0.83 | RORC (0.53) | TRPA1HSP90AA1HSP90AB1ESR1ESR2 | |
| SCHEMBL27563767 | 0.81 | ALDH1A1 (0.43) | TRPA1GABRA1GABRB2LMNASLC6A2 | |
| SCHEMBL3429786 | 0.80 | KDM4E (0.57) | TRPA1GABRA1GABRB2HSP90AA1HSP90AB1 | |
| SCHEMBL28394662 | 0.80 | TRPA1 (0.47) | TRPA1LMNAESR1ESR2ALDH1A1 | |
| SCHEMBL5200323 | 0.77 | CA1 (0.56) | GABRA1GABRB2LMNASLC6A2HTR2B | |
| SCHEMBL28604541 | 0.76 | ALDH1A1 (0.39) | TRPA1SLC6A2ALDH1A1TP53TDP1 | |
| SCHEMBL18488056 | 0.76 | ALDH1A1 (0.39) | TRPA1LMNAALDH1A1TP53TDP1 | |
| SCHEMBL24741214 | 0.75 | ALDH1A1 (0.42) | TRPA1ESR1ESR2ALDH1A1TP53 | |
| SCHEMBL16954753 | 0.73 | TDP1 (0.42) | TRPA1LMNASLC6A2HTR2BCHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4039630-A | Elastomer | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-08-02 | — | — | US | claimed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9346750-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-24 | — | — | US | disclosed |
| US-9346750-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-24 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| CN-1234706-C | Nitrogen-oxygen heterocyclic compound and preparation method thereof | CHANGCHUN ARTIFICIAL RESIN FAC (CN) | 2006-01-04 | — | — | CN | disclosed |
| CN-1490318-A | Nitrogen-oxygen heterocyclic compound and preparation method thereof | 长春人造树脂厂股份有限公司 | 2004-04-21 | — | — | CN | disclosed |
| US-6211328-B1 | IN PRESENCE OF AN ACID | GUN EI CHEMICAL INDUSTRY CO., LTD (JP) | 2001-04-03 | — | — | US | disclosed |
| US-5124234-A | Protective coating for printed circuits | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-23 | — | — | US | disclosed |
| US-4039630-A | Elastomer | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | TRPA1 59/4885GABRA1 1507/4885GABRB2 3542/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | TRPA1 786/4885GABRA1 1104/4885GABRB2 2904/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | TRPA1 951/4885GABRA1 1232/4885GABRB2 2889/4885 |
| US-10377692-B2 | Photoresist composition | C1R, C1S, F12 | TRPA1 79/4885GABRA1 1458/4885GABRB2 3460/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.