SCHEMBL6853258

SCHEMBL6853258

O=Cc1ccc(C(F)(F)F)cc1C=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.42
MAPT P10636 1/20 0.42
KDM4E B2RXH2 2/20 0.41
BACE1 P56817 1/20 0.41
ALOX5AP P20292 1/20 0.40
FEN1 P39748 1/20 0.40
LMNA P02545 2/20 0.40
MEN1 O00255 1/20 0.40
THRB P10828 1/20 0.40
BLM P54132 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CES2 O00748 3/20 0.39
EPHX2 P34913 1/20 0.39
SCN4A P35499 1/20 0.39
PTPN5 P54829 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ALDH1A1 P00352 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29122745 0.88 POLB (0.38) POLBMAPTKDM4EBACE1ALOX5AP
SCHEMBL4779383 0.85 ALDH1A1 (0.46) POLBMAPTKDM4EBACE1ALOX5AP
SCHEMBL30106727 0.85 ALDH1A1 (0.46) POLBMAPTKDM4EBACE1ALOX5AP
SCHEMBL2161118 0.84 ESR1 (0.41) POLBMAPTALOX5APFEN1LMNA
SCHEMBL30510666 0.84 ESR1 (0.41) POLBMAPTALOX5APFEN1LMNA
SCHEMBL18002337 0.83 AHR (0.50) BACE1
SCHEMBL3033291 0.83 CYP1A1 (0.46) POLBMAPTKDM4EBACE1LMNA
SCHEMBL153434 0.83 CYP1A1 (0.44) POLBMAPTKDM4EBACE1ALOX5AP
SCHEMBL663646 0.83 CES2 (0.50) POLBMAPTKDM4EBACE1ALOX5AP
SCHEMBL472401 0.83 CES2 (0.50) POLBMAPTKDM4EBACE1ALOX5AP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-20210309866-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-07 US disclosed
EP-3812805-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-04-28 EP disclosed
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed
US-20190225804-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-25 US disclosed
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-17 US disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 US disclosed
US-9890250-B2 Method for producing polybenzoxazole resin TOKYO OHKA KOGYO CO., LTD. (JP) 2018-02-13 US disclosed
EP-2947112-B1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO LTD (JP) 2017-09-13 EP disclosed
US-20170115563-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-04-27 US disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed
US-20150337084-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-26 US disclosed
EP-2947112-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-25 EP disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed
US-4471107-A Process for the prepartion of vinylpolystyrylpyridine compounds AMERICAN CYANAMID COMPANY (US) 1984-09-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT SLC9A2, SLC9A1, NHERF1 POLB 2120/4885MAPT 2522/4885KDM4E 4167/4885
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element SLC9A2, SLC9A1, NHERF1 POLB 2120/4885MAPT 2522/4885KDM4E 4167/4885
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 POLB 806/4885MAPT 35/4885KDM4E 3300/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.